2006
DOI: 10.1016/j.tca.2005.10.006
|View full text |Cite
|
Sign up to set email alerts
|

Polyhedral oligomeric silsesquioxanes (POSS) thermal degradation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

17
223
0
1

Year Published

2008
2008
2022
2022

Publication Types

Select...
8
1

Relationship

0
9

Authors

Journals

citations
Cited by 353 publications
(241 citation statements)
references
References 26 publications
17
223
0
1
Order By: Relevance
“…At about 500 • C one can notice a small change of weight that can be related to polymerization of vinyl groups in the less volatile material. The same process was reported in the literature for poly(vinylsilsesquioxanes) [36] as well as for Vi-PSQ and Vi-LPSQs synthesized in CH 3 COOEt and THF (Fig. 13a-c).…”
Section: Structural Analysis and Physiochemical Propertiessupporting
confidence: 53%
“…At about 500 • C one can notice a small change of weight that can be related to polymerization of vinyl groups in the less volatile material. The same process was reported in the literature for poly(vinylsilsesquioxanes) [36] as well as for Vi-PSQ and Vi-LPSQs synthesized in CH 3 COOEt and THF (Fig. 13a-c).…”
Section: Structural Analysis and Physiochemical Propertiessupporting
confidence: 53%
“…Two step (833 and 923 K) thermooxidative decomposition of Ph-LPSQ in air by release of benzene and combustion of the organic part results in the formation of silica (residue of 46%, calculated 46.5%). An analogous thermal behavior was reported for octahedral phenylsilsesquioxane, both in N 2 and air [55].…”
Section: Preparation Of Ph-lpsq-sio 2 Compositessupporting
confidence: 77%
“…Minor transitions occur at 763 K (only for samples of low M w ) and 953 K. Residue left in N 2 at 1173 K (71%) is larger than the calculated one (41%), which suggests entrapment of carbon in the structure during the process [55]. TGA traces in N 2 show also a small increase of sample weight above 1073 K that can be related to the formation of silicon nitride in the process of carbothermal reduction of Si-O structures in the residue [56,57].…”
Section: Preparation Of Ph-lpsq-sio 2 Compositesmentioning
confidence: 71%
“…We have in progress a wide research, concerning the synthesis and the characterization of new thermally stable nanocomposites of polystyrene (PS) and polyolefins having POSSs as fillers. Some RR' 7 (SiO 1.5 ) 8 POSSs (where R' = cyclopentyl or isobutyl and R = C 6 H 5 -or one of its mono-, di-or tri-substituted derivatives) were previously synthesized and characterized [30,31], owing to their good compatibility and solubility in polymer matrices due to the presence of aliphatic and cycloaliphatic groups linked to silicon cage [32][33][34][35]. The results obtained indicated better thermal properties for heptacyclopentyl-POSSs in comparison with the corresponding heptaisobutyl-derivatives, and, in particular, phenyl, heptacyclopentyl-POSS (ph,hcp-POSS) appeared the most thermally stable [30,31].…”
mentioning
confidence: 99%