Polymeric lithography editor: Editing lithographic errors with nanoporous polymeric probes

Rajasekaran, Pradeep Ramiah; Zhou, Chuanhong; Dasari, Mallika; Voss, Kay‐Obbe; Trautmann, C.; Kohli, Punit

doi:10.1126/sciadv.1602071

Cited by 7 publications

(24 citation statements)

References 63 publications

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“…Tracks are usually stochastically distributed over the exposed target area, but can also be precisely placed on predefined positions using a heavy-ion microprobe. The application of targeted irradiations includes writing specific patterns [33], testing microelectronic circuits [34], and delivering a preset number of ions to the nuclei of individual living cells [35]. In the following subsections we present a few examples of exciting research topics based on SHIs.…”

Section: Applications Of Swift Heavy Ionsmentioning

confidence: 99%

Fundamental Phenomena and Applications of Swift Heavy Ion Irradiations

Lang

Djurabekova

Medvedev

et al. 2020

Comprehensive Nuclear Materials

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This review concentrates on the specific properties and characteristics of damage structures generated with high-energy ions in the electronic energy loss regime. Irradiation experiments with so-called swift heavy ions (SHI) find applications in many different fields, with examples presented in ion-track nanotechnology, radiation hardness analysis of functional materials, and laboratory tests of cosmic radiation. The basics of the SHI-solid interaction are described with special attention to processes in the electronic subsystem. The broad spectrum of damage phenomena is exemplified for various materials and material classes, along with a description of typical characterization techniques. The review also presents state-of-the-art modeling efforts that try to account for the complexity of the coupled processes of the electronic and atomic subsystems. Finally, the relevance of SHI phenomena for effects induced by fission fragments in nuclear fuels and how this knowledge can be applied to better estimate damage risks in nuclear materials is discussed.

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Section: Applications Of Swift Heavy Ionsmentioning

confidence: 99%

Fundamental Phenomena and Applications of Swift Heavy Ion Irradiations

Lang

Djurabekova

Medvedev

et al. 2020

Comprehensive Nuclear Materials

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“…However, these methods require expensive facilities and time-consuming preparations. (2) Mask-less (serial) lithography, including beam and pen-based lithography, − generates direct-write and on-demand patterns. However, these methods generally have a low-throughput and are not reproducible.…”

Section: Introductionmentioning

confidence: 99%

Fiber Lithography: A Facile Lithography Platform Based on Electromagnetic Phase Modulation Using a Highly Birefringent Electrospun Fiber

Kim

Shin

Chang

2020

ACS Appl. Mater. Interfaces

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Lithography plays a key role in advancing manufacturing as well as the semiconductor industry. However, the currently available state-of-the-art lithography methods still require access to expensive tools and facilities. Herein, we suggest a novel lithography method based on electromagnetic phase modulation of ultraviolet using a highly birefringent electrospun fiber to overcome such limitations. The optical birefringent effect, by which the phase of incident ultraviolet electromagnetic fields is retarded when passing through optically anisotropic media, is combined with semicrystalline poly(ethylene oxide) (PEO)− poly(ethylene glycol) (PEG) polymeric microfibers patterned in a programmable form using near-field electrospinning. By positioning the mask between two linear polarizers that are perpendicular to each other, only the UV waves that are passing through the fibers can be selectively utilized to exhibit lithographic property. Therefore, the UV intensity on the photoresist (PR) surface follows the shape of the fiber pattern, enabling precisely controlled patterning of the photoresist. Zero-to two-dimensional key features of lithography are achieved, including straight, curved, array, and isolated patterns. Facile optical alignments without using dedicated alignment marks are successfully demonstrated, as well as various applications including micro-to macroscale serpentine, tree, and antenna circuit patterns on a flexible substrate. The presented approach, packed in a table-top scale, is expected to provide a practical and affordable lithography solution by leveraging the directwriting capability and tunable optical functionality of polymers, scalability, and the simple optical alignment method.

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“…Recently, an error rectifying method using polymer lithography editor (PLE) was introduced, where a soft probe composed of agarose hydrogel allowed molecular erasing and writing mediated through a meniscus formed between the probe and substrate. 40 The rectification process "writing-erasing-rewriting" was demonstrated by "writing" ~10 µm fluorescein array dots on glass substrate.…”

Section: Introductionmentioning

confidence: 99%

“…For example, in the case of nanoshaving and nanodrafting, the mechanical erasing requires intimate probe-surface contact that may damage and/or induce defects in probe tips and substrates. Recently, an error rectifying method using a polymer lithography editor (PLE) was introduced, where a soft probe composed of agarose hydrogel allowed for molecular erasing and writing mediated through a meniscus formed between the probe and substrate . The rectification process “writing–erasing–rewriting” was demonstrated by “writing” ∼10 μm fluorescein array dots on the glass substrate.…”

Section: Introductionmentioning

confidence: 99%

“…An initial step involves the solvation of the patterned molecules by solvent molecules transported from the tip or molecules that are already present on the substrate surface. This is followed by a second step, where solvated molecules diffuse into the nanoporous PLE tip matrix driven by the concentration gradient . Similarly, the writing/rewriting process was accomplished by transport of the ink molecules through the meniscus at the PLE probe–substrate interface.…”

Section: Introductionmentioning

confidence: 99%

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Electrochemical Erasing Using a Polymer Lithography Editor for the Fabrication of Photoactive Devices

Becerra-Mora

Vargas-Lizarazo

Orrison

et al. 2019

ACS Appl. Electron. Mater.

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Electrochemical erasing of conductive coatings at microscale for the fabrication of functional devices on flexible and hard surfaces is demonstrated. The nanoporous pyramidal-shaped nano-and micro-scale polyacrylamide hydrogel PLE probes allowed delivery of electrochemical etchants to the surface providing on-demand maskless patterning at microscale. Highly efficient erasing (silver and copper metals erasing efficiency ≈100%), areal erasing rate ≈80 m 2 /s, and pressure dependent spatial erasing feature dimensions between 3 m to many tens of microns on metal surfaces allowed fabrication of microelectrodes of various geometries. Overall, PLEbased microscale erasing allowed rapid and accessible fabrication of organic

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Polymeric lithography editor: Editing lithographic errors with nanoporous polymeric probes

Abstract: Molecular editing at the submicrometer scale using optical feedback–facilitated polymer probes.

Cited by 7 publications

References 63 publications

Fundamental Phenomena and Applications of Swift Heavy Ion Irradiations

Fundamental Phenomena and Applications of Swift Heavy Ion Irradiations

Fiber Lithography: A Facile Lithography Platform Based on Electromagnetic Phase Modulation Using a Highly Birefringent Electrospun Fiber

Electrochemical Erasing Using a Polymer Lithography Editor for the Fabrication of Photoactive Devices

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