Polymers in conventional and alternative lithography for the fabrication of nanostructures

Acikgöz, Canet; Hempenius, Mark A.; Huskens, Jurriaan; Vancso, Gyula J.

doi:10.1016/j.eurpolymj.2011.07.025

Cited by 167 publications

(107 citation statements)

References 161 publications

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Section: Published Inmentioning

confidence: 99%

“…However, patterning materials with nanoscale features aimed at improving integration and device performance poses several challenges. The limitations of conventional lithography techniques related to resolution, operational costs and lack of flexibility to pattern organic and novel materials have motivated the development of unconventional fabrication methods [1][2][3] .Since the first patterning experiments performed with a scanning probe microscope in the late 80s, scanning probe lithography (SPL) has emerged as an alternative lithography for academic research that combines nanoscale feature-size, relatively low technological requirements and the ability to handle soft matter from small organic molecules to proteins and polymers. Scanning probe lithography experiments have provided striking examples of its capabilities such as the ability to pattern 3D structures with nanoscale features 4 , the fabrication of the smallest field-effect transistor 5 or the patterning of proteins with 10 nm feature size 6 .…”

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confidence: 99%

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Advanced scanning probe lithography

2014

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The nanoscale control afforded by scanning probe microscopes has prompted the development of a wide variety of scanning probe-based patterning methods. Some of these methods have demonstrated a high degree of robustness and patterning capabilities that are unmatched by other lithographic techniques. However, the limited throughput of scanning probe lithography has prevented their exploitation in technological applications. Here, we review the fundamentals of scanning probe lithography and its use in materials science and nanotechnology. We focus on the methods and processes that offer genuinely lithography capabilities such as those based on thermal effects, chemical reactions and voltage-induced processes. Published in:Nature Nanotechnology 9, 577-587 (2014) Progress in nanotechnology depends on the capability to fabricate, position, and interconnect nanometre-scale structures. A variety of materials and systems such as nanoparticles, nanowires, two-dimensional materials like graphene and transition metal dichalcogenides, plasmonics materials, conjugated polymers and organic semiconductors are finding applications in nanoelectronics, nanophotonics, organic electronics and biomedical applications. The success of many of the above applications relies on the existence of suitable nanolithography approaches. However, patterning materials with nanoscale features aimed at improving integration and device performance poses several challenges. The limitations of conventional lithography techniques related to resolution, operational costs and lack of flexibility to pattern organic and novel materials have motivated the development of unconventional fabrication methods [1][2][3] .Since the first patterning experiments performed with a scanning probe microscope in the late 80s, scanning probe lithography (SPL) has emerged as an alternative lithography for academic research that combines nanoscale feature-size, relatively low technological requirements and the ability to handle soft matter from small organic molecules to proteins and polymers. Scanning probe lithography experiments have provided striking examples of its capabilities such as the ability to pattern 3D structures with nanoscale features 4 , the fabrication of the smallest field-effect transistor 5 or the patterning of proteins with 10 nm feature size 6 . Figure 1a shows a general scheme of SPL operation. There is a variety of approaches to modify a material in a probe-surface interface which have generated several SPL methods. Scanning probe lithographies can be either classified by emphasizing the distinction between the general nature of the process, chemical versus physical, or by considering if SPL implies the removal or addition of material. However, we consider it is more inclusive and systematic to classify the different SPL methods in terms of the driving mechanisms used in the patterning process, namely thermal, electrical, mechanical and diffusive methods (Fig. 1b). Challenges in nanoscale lithographyThe workhorse of large volume CMOS fabrication, o...

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Section: Published Inmentioning

confidence: 99%

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confidence: 99%

Advanced scanning probe lithography

2014

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“…Different mask-less lithography techniques are developed whose key advantage is the ability to change lithography patterns from one run to the next, without incurring the cost of generating a new photomask. Some of the maskless techniques include electron beam lithography (EBL), focused ion beam (FIB) lithography, scanning probe lithography (SPL), direct laser writing (DLW) technique, and dip pen lithography (DPL) [4][5][6][7][8]. Optical waveguides and devices using SU-8 material are of today's interest due to their potential applications in optical communications, optical interconnect, and integrated optics.…”

Section: Introductionmentioning

confidence: 99%

Focused Ion Beam Fabrication of SU-8 Waveguide Structures on Oxidized Silicon

2017

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This work deals with SU-8 waveguides and waveguide structures fabricated on an oxidized silicon substrate using 'Focused ion beam (FIB) lithography'. From our experimentation it seems that FIB method is practically not suitable for fabricating long SU-8 waveguide structures, rather it is more suitable for nanoscale modification of already fabricated waveguides, such as, to fabricate photonic crystal structures.

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“…Alternative methods for high-resolution patterning of soft polymers have found some success, and include nano-imprint lithography or stamping 23,24 , and self-assembly 1,25 ; these methods allow for highly parallelized fabrication of submicron structures on polymer substrates. All such approaches pose problems for fabrication of implantable microdevices, including difficulties aligning multi-layer patterns, restrictions on material choice, and for nano-imprint lithography, use of high temperatures and pressures, which can deform polymer substrates.…”

Section: Introductionmentioning

confidence: 99%

Electron-beam lithography for polymer bioMEMS with submicron features

Scholten

Meng

2016

Microsyst Nanoeng

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We present a method for submicron fabrication of flexible, thin-film structures fully encapsulated in biocompatible polymer poly (chloro-p-xylylene) (Parylene C) that improves feature size and resolution by an order of magnitude compared with prior work. We achieved critical dimensions as small as 250 nm by adapting electron beam lithography for use on vapor deposited Parylene-coated substrates and fabricated encapsulated metal structures, including conducting traces, serpentine resistors, and nano-patterned electrodes. Structures were probed electrically and mechanically demonstrating robust performance even under flexion or torsion. The developed fabrication process for electron beam lithography on Parylene-coated substrates and characterization of the resulting structures are presented in addition to a discussion of the challenges of applying electron beam lithography to polymers. As an application of the technique, a Parylene-based neural probe prototype was fabricated with 32 recording sites patterned along a 2 mm long shank, an electrode density surpassing any prior polymer probe.

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Polymers in conventional and alternative lithography for the fabrication of nanostructures

Cited by 167 publications

References 161 publications

Advanced scanning probe lithography

Advanced scanning probe lithography

Focused Ion Beam Fabrication of SU-8 Waveguide Structures on Oxidized Silicon

Electron-beam lithography for polymer bioMEMS with submicron features

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