1980 International Electron Devices Meeting 1980
DOI: 10.1109/iedm.1980.189933
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Polysilicon FET devices for large area input/output applications

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Cited by 26 publications
(10 citation statements)
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“…In 1979, amorphous silicon as a new active material was introduced by LeComber et al [ 13 ], which had profound implications for TFTs. In 1980, Depp et al reported polysilicon TFT which achieved good mobility and TFT characteristics [ 14 ]. In 1986, the first transistor based on organic semiconductor was reported [ 15 ].…”
Section: Introductionmentioning
confidence: 99%
“…In 1979, amorphous silicon as a new active material was introduced by LeComber et al [ 13 ], which had profound implications for TFTs. In 1980, Depp et al reported polysilicon TFT which achieved good mobility and TFT characteristics [ 14 ]. In 1986, the first transistor based on organic semiconductor was reported [ 15 ].…”
Section: Introductionmentioning
confidence: 99%
“…Inorganic materials, organic materials, and inorganic/organic hybrid materials have been used as semiconducting channels in thin film field‐effect transistors (TF‐FET). In particular, in the 1980s, International Business Machines Corporation (IBM) reported poly‐silicon based thin film transistors, and since then, silicon has been widely used as transistor material for the design and application of commercial devices . The structure of the field‐effect transistor (FET) is basically composed of three electrodes, and a current flows between two electrodes.…”
Section: Introductionmentioning
confidence: 99%
“…In particular, in the 1980s, International Business Machines Corporation (IBM) reported poly-silicon based thin film transistors, and since then, silicon has been widely used as transistor material for the design and application of commercial devices. 1 The structure of the field-effect transistor (FET) is basically composed of three electrodes, and a current flows between two electrodes. An external applied voltage controls the current flow between the two electrodes.…”
Section: Introductionmentioning
confidence: 99%
“…1 shows the roadmap of the TFT technology development. [17] There are four kinds of semiconductor materials being widely used as the channel layer of the TFT: 1) hydrogenated amorphous silicon (a-Si:H) TFT, which was first demonstrated in 1979 by P. Le Comber, W. Spear, and A. Ghaith [4] ; 2) low temperature polycrystalline silicon (LTPS) TFT, which started to boom since S. Depp succeeded in producing the first working device in 1980 [18] ; 3) organic TFT, which was first reported with polythiophene channel layer by A. Tsumura in 1986 [19] ; 4) metal-oxide TFT, which was first demonstrated with p-type SnO2 channel layer by Klasens in 1964 [20] . The first crystalline GIZO TFT fabricated on the YSZ (111) substrate was reported in 2003 by Hosono team [44] .…”
Section: Background Of Different Tft Technologiesmentioning
confidence: 99%