2007
DOI: 10.2473/journalofmmij.123.704
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Polysilicon Production in Mitsubishi Materials Corporation

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Cited by 5 publications
(3 citation statements)
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“…The yield of SiHCl 3 in the product silane gas is almost 90 %, and the major remaining species is SiCl 4 . [22,78] The SiHCl 3 product is then purified by using distillation to utilize the difference between its boiling point and those of the impurities. A distillation tower with several tens of trays is used for producing high-purity SiHCl 3 .…”
Section: H 2 Reduction And/or Thermal Decomposition Of Sihcl 3 (Siemementioning
confidence: 99%
See 1 more Smart Citation
“…The yield of SiHCl 3 in the product silane gas is almost 90 %, and the major remaining species is SiCl 4 . [22,78] The SiHCl 3 product is then purified by using distillation to utilize the difference between its boiling point and those of the impurities. A distillation tower with several tens of trays is used for producing high-purity SiHCl 3 .…”
Section: H 2 Reduction And/or Thermal Decomposition Of Sihcl 3 (Siemementioning
confidence: 99%
“…The produced Si has ntype characteristics, and its specific resistance is above 1000 W cm À1 . [22] The decomposition of SiHCl 3 to form Si proceeds above 673 K, [80] and the Si deposition temperature can be lowered or the Si deposition speed can be accelerated by introducing H 2 gas into the system. In the temperature range of the Siemens process, H 2 reduction and thermal decomposition proceed simultaneously.…”
Section: H 2 Reduction And/or Thermal Decomposition Of Sihcl 3 (Siemementioning
confidence: 99%
“…The details of each production process are examined based on original literature and published review articles. [4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19] Most methods used for producing high-purity silicon utilize silicon compounds as intermediate feed materials that can be purifi ed to a high degree by conventional technologies. First the low-purity MG-Si is converted into silicon compounds.…”
Section: Kouji Yasuda and Toru H Okabementioning
confidence: 99%