2014
DOI: 10.1016/j.cossms.2014.02.001
|View full text |Cite
|
Sign up to set email alerts
|

Positive exchange bias in epitaxial permalloy/MgO integrated with Si (100)

Abstract: a b s t r a c tIn magnetic random access memory (MRAM) devices, soft magnetic thin film elements such as permalloy (Py) are used as unit cells of information. The epitaxial integration of these elements with the technologically important substrate Si (1 0 0) and a thorough understanding of their magnetic properties are critical for CMOS-based magnetic devices. We report on the epitaxial growth of Ni 82.5 Fe 17.5 (permalloy, Py) on Si (1 0 0) using a TiN/MgO buffer layer. Initial stages of growth are characteri… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1
1
1
1

Citation Types

1
9
0

Year Published

2014
2014
2016
2016

Publication Types

Select...
6
1

Relationship

3
4

Authors

Journals

citations
Cited by 15 publications
(10 citation statements)
references
References 40 publications
1
9
0
Order By: Relevance
“…The authors believe that this is not the case here as our STEM-Z images show clean and sharp interfaces with no NiO present. Such positive exchange bias has been observed in the authors' earlier work [46][47][48] on Ni 82·5 Fe 17·5 /MgO/TiN/Si (100) when the sample was zero field cooled. The observed variation in the nature of exchange bias may be assigned to the morphologyassociated residual strain and magnetic anisotropy.…”
Section: Multifunctional Heterostructures Integrated On Si (100)mentioning
confidence: 62%
See 1 more Smart Citation
“…The authors believe that this is not the case here as our STEM-Z images show clean and sharp interfaces with no NiO present. Such positive exchange bias has been observed in the authors' earlier work [46][47][48] on Ni 82·5 Fe 17·5 /MgO/TiN/Si (100) when the sample was zero field cooled. The observed variation in the nature of exchange bias may be assigned to the morphologyassociated residual strain and magnetic anisotropy.…”
Section: Multifunctional Heterostructures Integrated On Si (100)mentioning
confidence: 62%
“…The authors have epitaxially integrated Py with Si (100), as would be appropriate for integration with present-day microelectronic devices. [46][47][48] From the OOP and IP XRD measurements, it was found that Py films were grown epitaxially. The SEM and AFM characterisations of the film morphology revealed that the films of 6000 and 12 000 pulses were surprisingly similar, which may indicate that ablation rates from the Py target were dropping significantly over time.…”
Section: Permalloy (Py) On Si (100)mentioning
confidence: 99%
“…Advances in 0D [9], 1D [10] and 2D [11][12][13][14][15][16][17][18][19][20][21][22][23][24][25][26] material fabrication technologies have enabled various forms of nanoscale materials, which can be used as nanostructured anodes to accommodate the large volume changes during cycling. For example, silicon nanowire anodes were reported to retain high capacity during several charge-discharge cycles in spite of an initial volume change of 400% [27], while bulk silicon loses more than 80% of its capacity in less than 10 cycles due to pulverization [28].…”
Section: Importance Of Developing Platforms Enabling In-situ Electrocmentioning
confidence: 99%
“…Advances in 0D [32], 1D [33] and 2D [34][35][36][37][38][39][40][41][42][43][44][45][46][47][48][49] material fabrication technologies have enabled various forms of nanoscale materials, which increased the needs of in-situ ETEM studies through the closed-type approach, i.e. windowed gas cells.…”
Section: Windowed Gas Cells (Closed Type Etem)mentioning
confidence: 99%