Positron Annihilation Study on Nanocrystalline Copper Thin Films Doped with Nitrogen

Gordo, P.M.; Marques, M.F. Ferreira; Vieira, M.T.

doi:10.1007/978-3-319-50784-2_2

Cited by 1 publication

(1 citation statement)

References 19 publications

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“…5, the S parameter (mainly reflects the information of positron annihilation with valence electrons) of the pristine nanochannel W-600-150W film first decreased from the surface to the depth of ~ 30 nm and then gradually increased. Because the free surface introduced by nanochannel is open-volume that can be used as a trap center of positrons [35] and the density of nanochannel increases with depth, the S parameter increased gradually with depth rather than the continuous decrease of the S parameter in the bulk W.and the density of nanochannel increases with depth. The S parameter increased gradually with the increase of depth rather than the continuous decrease of S parameter in the bulk W [36].…”

Section: Kev He + Ions Irradiation Under Low Fluencementioning

confidence: 99%

Review on helium behaviors in nanochannel tungsten film

et al. 2021

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Tungsten (W) as plasma facing material (PFM) needs to face an unprecedented harsh environment in the fusion reactor, which puts forward high requirements for its radiation tolerance. Among the many challenges, the rapid accumulation of helium (He) atoms to form numerous bubbles or even "fuzzy" nanostructure leads to swelling and embrittlement of W matrix and seriously shorten its service life, which is one of the most serious problems faced by PFM-W at present. In this review, we summarize the recent works on the nanochannel W films with high surface-to-volume ratio deposited by magnetron sputtering, and the behaviors of He in the nanochannel W films at different fusion-related irradiation environment. Experimental and simulation results showed that the nanochannel W films have better radiation tolerance performance in managing He behaviors than that of commercial bulk W.

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Section: Kev He + Ions Irradiation Under Low Fluencementioning

confidence: 99%