2018
DOI: 10.1109/tcpmt.2018.2840959
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Post-CMOS Fabrication Technology Enabling Simultaneous Fabrication of 3-D Solenoidal Micro-Inductors and Flexible I/Os

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Cited by 3 publications
(2 citation statements)
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“…3D micromachined processes for low-profile inductors typically involve several resist-mold electroplating and sacrificial layers to construct multiple levels of conductors. Zia et al 32 reported a 110-µm-tall domed-shaped solenoidal inductor for RF applications, as shown in Fig. 5a.…”
Section: D Surface Micromachiningmentioning
confidence: 99%
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“…3D micromachined processes for low-profile inductors typically involve several resist-mold electroplating and sacrificial layers to construct multiple levels of conductors. Zia et al 32 reported a 110-µm-tall domed-shaped solenoidal inductor for RF applications, as shown in Fig. 5a.…”
Section: D Surface Micromachiningmentioning
confidence: 99%
“…Fig.53D on-substrate inductors. a 3D air-core solenoidal inductor with dome-shaped windings32 (Copyright IEEE 2018). b 3D magnetic-core solenoidal inductor with a profile of 150 µm 37 (Copyright IEEE 2019).…”
mentioning
confidence: 99%