2015
DOI: 10.1088/0022-3727/48/6/063001
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Potentials and challenges of integration for complex metal oxides in CMOS devices and beyond

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Cited by 10 publications
(9 citation statements)
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“…3(b). 218,220 The growth of complex oxides on semiconducting substrates, particularly Si, has been intensively investigated, with the aim of integrating complex oxides in semiconductor platforms to realize multifunctional electronic and electro-optic devices 167,[251][252][253][254][255][256][257][258][259][260] and for using high-κ dielectric oxides as alternatives to SiO for gate dielectrics in MOSFET transistors. 170,[261][262][263] The challenge is to achieve epitaxial growth and a sharp interface without the formation of an interfacial oxide amorphous layer that may be formed by exposure of the clean semiconducting surface to the oxygen species required for the metal oxide growth or due to reaction with the oxide layer, that could degrade device performance.…”
Section: Batiomentioning
confidence: 99%
“…3(b). 218,220 The growth of complex oxides on semiconducting substrates, particularly Si, has been intensively investigated, with the aim of integrating complex oxides in semiconductor platforms to realize multifunctional electronic and electro-optic devices 167,[251][252][253][254][255][256][257][258][259][260] and for using high-κ dielectric oxides as alternatives to SiO for gate dielectrics in MOSFET transistors. 170,[261][262][263] The challenge is to achieve epitaxial growth and a sharp interface without the formation of an interfacial oxide amorphous layer that may be formed by exposure of the clean semiconducting surface to the oxygen species required for the metal oxide growth or due to reaction with the oxide layer, that could degrade device performance.…”
Section: Batiomentioning
confidence: 99%
“…Synthesis of porous CFO ,, and ALD deposition of BFO , have been discussed previously. A schematic of the synthesis can be found in Figure a.…”
Section: Methodsmentioning
confidence: 99%
“…46−48 Bismuth ferrite (BiFeO 3 or BFO), however, maintains higher d 33 values than PZT in the ultrathin (<5 nm) regime. 45,49,50 Thus, while PZT has a higher d 33 than BFO in the bulk, BFO is expected to have a higher d 33 in ultrathin films, meaning the magnetization changes are also expected to be larger. In this work, we thus focus on CFO/BFO composites and show that the trend of increasing multiferroic coupling with increasing porosity is robust across materials systems.…”
Section: Introductionmentioning
confidence: 99%
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“…MOS sensors are small and can be constructed as integrated circuits. However, the applications of MOS sensors are limited to “moderate” gases such as CO 2 and H 2 , and they are not suitable for sulfur containing gases which can bind with the sensing materials [ 48 , 49 , 50 , 51 ]. The operation of MOS sensors requires high temperatures of around 200–500 °C, which is beyond the temperature range that a common battery can achieve and, thus, limits practical field applications.…”
Section: Electronic Nose Detecting Technologymentioning
confidence: 99%