2023
DOI: 10.3390/mi14112045
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Power Electronics Revolutionized: A Comprehensive Analysis of Emerging Wide and Ultrawide Bandgap Devices

S Rafin,
Roni Ahmed,
Md. Haque
et al.

Abstract: This article provides a comprehensive review of wide and ultrawide bandgap power electronic semiconductor devices, comparing silicon (Si), silicon carbide (SiC), gallium nitride (GaN), and the emerging device diamond technology. Key parameters examined include bandgap, critical electric field, electron mobility, voltage/current ratings, switching frequency, and device packaging. The historical evolution of each material is traced from early research devices to current commercial offerings. Significant focus is… Show more

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Cited by 21 publications
(6 citation statements)
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“…Compared to first-generation semiconductor materials (such as Si), third-generation wide-bandgap-power semiconductors exhibit unparalleled advantages such as high thermal conductivity, high electron mobility, wide bandgap, and strong chemical inertness [1]. Currently, SiC is the most well-developed third-generation semiconductor material and has the best comprehensive performance.…”
Section: Introductionmentioning
confidence: 99%
“…Compared to first-generation semiconductor materials (such as Si), third-generation wide-bandgap-power semiconductors exhibit unparalleled advantages such as high thermal conductivity, high electron mobility, wide bandgap, and strong chemical inertness [1]. Currently, SiC is the most well-developed third-generation semiconductor material and has the best comprehensive performance.…”
Section: Introductionmentioning
confidence: 99%
“…Therefore, the GaN structure is more suitable for high-frequency electronic power applications. However, due to the poor thermal conductivity of GaN, it is more commonly used in low-power applications [43].…”
Section: Inverter Design and Power Loss Calculationmentioning
confidence: 99%
“…Following the conceptualization of the Field Effect Transistor (FET) by J. E. Lilienfeld in 1925 [5], the first junction field effect transistor (JFET) was presented by Henrich Welker in 1945 [6]. Subsequently, in 1959, Mohamed Atalla and Dawon Kahng pioneered the silicon metal oxide semiconductor field effect transistor (Si-MOSFET) [7]. This marked a crucial milestone in transistor development, introducing a new paradigm with enhanced performance characteristics.…”
Section: Development History Of Transistormentioning
confidence: 99%