Conference on Lasers and Electro-Optics 1985
DOI: 10.1364/cleo.1985.fk3
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Practical photomask pinhole defect repair using micrometer scale pattern Cd CVD with kHz repetition UV light pulses

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Cited by 2 publications
(2 citation statements)
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“…Methods developed for this purpose have included laser beam induced chemical vapor deposition (CVD) (Ref. 1,2) or ion beam deposition.…”
mentioning
confidence: 99%
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“…Methods developed for this purpose have included laser beam induced chemical vapor deposition (CVD) (Ref. 1,2) or ion beam deposition.…”
mentioning
confidence: 99%
“…(Ref. 1) Laser light was transmitted through a variable rectangle slit and its reduced image was projected onto the mask's defect portion. Fourth harmonics (266 nm), highly repetitive (>lkHz), high intensity, short light pulse from a Q-switched Nd:YAG laser was selected as a light source.…”
mentioning
confidence: 99%