“…The dominate microwave performance in MMICs is ferromagnetic resonance frequency f FMR , while the key approach to enhance f FMR is to increase the anisotropy magnetic field H K , as described by Kittel equation [7]. Many preparation methods were proposed to obtain a high H K , such as in-situ magnetic field deposition [8,9], post magnetic annealing, oblique sputtering [10,11], exchange coupling between ferromagnetic (FM) layer and antiferromagnetic (AFM) layer or FM layer with higher coercivity [12,13], and magnetoelectric (ME) coupling [14,15]. In our previous work [16][17][18][19], a novel composition gradient sputtering (CGS) method was applied to achieve a high uniaxial magnetic anisotropy in SMFs, which dramatically increased the in-plane uniaxial H K to 547 Oe due to the uniaxial stress distribution induced by composition gradient.…”