2011
DOI: 10.1063/1.3549589
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Precise control of domain wall injection and pinning using helium and gallium focused ion beams

Abstract: In experiments on current-driven domain wall (DW) motion in nanostrips with perpendicular magnetic anisotropy (PMA), the initial DW preparation is usually not well controlled. We demonstrate precise control of DW injection using Ga and novel He focused ion beam (FIB) irradiation to locally reduce the anisotropy in part of a Pt/Co/Pt strip. DWs experience pinning at the boundary of the irradiated area. This DW pinning is more pronounced at the He irradiation boundary compared to Ga. This is attributed to a bett… Show more

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Cited by 60 publications
(58 citation statements)
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“…Reproducible operation of such a device requires well-defined pinning sites, which are typically realized by locally altering the geometry 28 or material properties. [29][30][31] The ability to activate and deactivate these pinning sites, preferably at fast timescales, provides new device options and could greatly reduce the current density needed to move the domain walls from site to site. The devices by Bauer et al 26 relied on the effect of electromigration, which has its own advantages and disadvantages.…”
mentioning
confidence: 99%
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“…Reproducible operation of such a device requires well-defined pinning sites, which are typically realized by locally altering the geometry 28 or material properties. [29][30][31] The ability to activate and deactivate these pinning sites, preferably at fast timescales, provides new device options and could greatly reduce the current density needed to move the domain walls from site to site. The devices by Bauer et al 26 relied on the effect of electromigration, which has its own advantages and disadvantages.…”
mentioning
confidence: 99%
“…We now turn to a simple DW-energy model in order to verify these results, in particular, the magnitude of the observed pinning effect. In the previous experiments on permanent DW pinning sites created by Focused Ion Beam irradiation, 29,30 we developed a model to describe the pinning field at an anisotropy step DK (Ref. 30)…”
mentioning
confidence: 99%
“…3(a). Here, the red part indicates the region irradiated by Ga ions which reduce the perpendicular magnetic anisotropy and allow the nucleation of DWs on two sides [21]. However, this straight wire is not suitable for measuring the chiral resistance, as we will experimentally show later on, because the DW pair has an opposite chirality when applying a high in-plane field.…”
mentioning
confidence: 99%
“…One way to change the injection properties and to circumvent the issue described above is to change the boundary between the irradiated and unirradiated regions. 12,16 In the experimental data described above the region between the two parts of the nanowire was defined by the Gaussian width of the FIB beam. This is around 3.5 nm at the focal point of the beam.…”
Section: Domain Wall Nucleation and Injectionmentioning
confidence: 99%
“…Various methods to achieve this have been demonstrated including local Oersted fields, 6 manipulation of the in-plane shape 10,11 and irradiation by focussed ion beam (FIB). 12,13 FIB irradiation of perpendicular materials has been shown to reduce the anisotropy of the irradiated area, largely by causing intermixing of the heavy metal/magnetic interfaces which provide the perpendicular anisotropy. 14 The perpendicular anisotropy is a competition between an interfacial magnetocrystalline anisotropy and the demagnetizing energy of the layer.…”
Section: Introductionmentioning
confidence: 99%