2015
DOI: 10.1002/adma.201503592
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Precisely Controlled Ultrastrong Photoinduced Doping at Graphene–Heterostructures Assisted by Trap‐State‐Mediated Charge Transfer

Abstract: Ultrastrong and precisely controllable n-type photoinduced doping at a graphene/TiOx heterostructure as a result of trap-state-mediated charge transfer is demonstrated, which is much higher than any other reported photodoping techniques. Based on the strong light-matter interactions at the graphene/TiOx heterostructure, precisely controlled photoinduced bandgap opening of a bilayer graphene device is demonstrated.

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Cited by 39 publications
(52 citation statements)
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“…Consistently with the recent reports on UV light induced graphene doping 23, 26 , the permanent change of resistivity upon initial X-ray irradiation can be explained by an accumulation of positive charge within the gate oxide, which via capacitance coupling induces negative graphene doping (Fig. 2b).…”
Section: Resultssupporting
confidence: 90%
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“…Consistently with the recent reports on UV light induced graphene doping 23, 26 , the permanent change of resistivity upon initial X-ray irradiation can be explained by an accumulation of positive charge within the gate oxide, which via capacitance coupling induces negative graphene doping (Fig. 2b).…”
Section: Resultssupporting
confidence: 90%
“…Further measurements when the X-ray source remains switched off do not show any change in the BG trace even after several hours. If the device was taken out and its BG traces measured, the device returned to the pristine state (V BG  = +17 V) only after a 24-hour long exposure of the sample to ambient conditions, which is consistent with the UV/Vis irradiation induced doping effect reported to be stable under vacuum at least for several days 24, 26, 28 .…”
Section: Resultssupporting
confidence: 81%
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