1997
DOI: 10.1007/s005420050085
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Precision of micromilled x-ray masks and exposures

Abstract: Micromechanical milling has been shown to be a rapid and direct method for the fabrication of structures with the geometry and size suitable for use as x-ray mask absorbers. While the micromilling process can not duplicate the size and resolution of absorber patterns created by high energy electron beam or optical lithography methods, micromilling can repeatedly create absorber line widths down to 10 micrometers, or less, with a one-sigma tolerance of 0.5 micrometers. A method for easily characterizing milling… Show more

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