Predicting mask distortion, clogging and pattern transfer for stencil lithography

Lishchynska, Maryna; Bourenkov, Victor; Boogaart, M A F van den; Doeswijk, L M; Brugger, Juergen; Greer, James C.

doi:10.1016/j.mee.2006.08.003

Cited by 42 publications

(32 citation statements)

References 30 publications

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“…Owing to the direct transfer of the stencil, the thickness of the spin-coated PMMA spacer allows for precise control of the gap between the stencil and the substrate. The gap size has been reported to have a significant impact on the achievable resolution with nanostencil lithography, which is traditionally limited by geometric blurring (blurring from non-normal angle of incidence of material evaporated through the stencil), halo blurring (blurring from surface diffusion of deposited material), and stencil clogging (reduction in stencil aperture size due to deposition of material onto the stencil) 28,29 . For example, feature sizes of ~ 100 nm, and feature resolution down to 25 nm, were reported when the stencil is contacted directly with a flexible substrate, indicative primarily of the potential benefits of reductions in the gap between stencil and substrate 30 .…”

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confidence: 99%

High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

Jain

Aernecke

Liberman

et al. 2014

Applied Physics Letters

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Nanostencil lithography has a number of distinct benefits that make it an attractive nanofabrication processes, but the inability to fabricate features with nanometer precision has significantly limited its utility. In this paper, we describe a nanostencil lithography process that provides sub-15 nm resolution even for 40-nm thick structures by using a sacrificial layer to control the proximity between the stencil and substrate, thereby enhancing the correspondence between nanostencil patterns and fabricated nanostructures. We anticipate that controlled proximity nanostencil lithography will provide an environmentally stable, clean, and positive-tone candidate for fabrication of nanostructures with high-resolution.Significant advances in device physics across optical, electrical, and magnetic modalities have been enabled by the ability to fabricate structures with nanoscale precision. There is currently a large variety of top-down nanostructure fabrication methods available, such as electron beam lithography 1 ,

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confidence: 99%

High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

Jain

Aernecke

Liberman

et al. 2014

Applied Physics Letters

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“…This membrane thickness is required in order to pattern sub-100 nm apertures; however, membranes with such thickness are fragile to physical stress and may suffer deformations and ruptures. 19,33 To increase their stability, the fabricated membranes are corrugated instead of being planar. The corrugations have a hexagonal ring geometry shown in Figure 1b.…”

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confidence: 99%

“…The blurring is a consequence of the existence of a gap between the stencil and substrate as reported previously on structures deposited by stencil lithography. 16,33,[35][36][37] In order to extract the resistivity of the nanowires, electrical DC measurements at room temperature (∼293 K) were performed using a probe station and a HP parameter analyzer. The resistance of the nanowires was measured keeping the electrical current below 100 µA to prevent wire breakdown.…”

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Metallic Nanowires by Full Wafer Stencil Lithography

et al. 2008

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Aluminum and gold nanowires were fabricated using 100 mm stencil wafers containing nanoslits fabricated with a focused ion beam. The stencils were aligned and the nanowires deposited on a substrate with predefined electrical pads. The morphology and resistivity of the wires were studied. Nanowires down to 70 nm wide and 5 µm long have been achieved showing a resistivity of 10 µΩcm for Al and 5 µΩcm for Au and maximum current density of ∼10 8 A/cm 2 . This proves the capability of stencil lithography for the fabrication of metallic nanowires on a full wafer scale.An important objective in nanotechnology is the development of alternative nanopatterning methods and the fabrication of novel nanoscale structures and materials. Among such structures, nanowires (NWs) have shown potential and applications in a broad range of fields such as electronics, 1,2 magnetic memories, 3 thermoelectric, 4,5 nanomechanical, 6 optoelectronic, 7 and biosensing devices 8-10 due to their physical properties and surface to volume ratio. In particular, metallic nanowires can be applied for interconnects, magnetic memories based on spin-polarized current 3 and biosensors. 9 To fabricate NWs, the two approaches used are the chemical synthesis (bottom-up) and the nanopatterning methods (topdown).

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“…SL also offers the potential for rapid nanopatterning of structures using the stencils several times [3]. However, SL still faces challenges for nanopatterning, like the blurring of the deposited structures due to the stencil-substrate gap [4]. Herein we show advances in the analysis, characterization and application of nanostructures deposited by SL.…”

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confidence: 96%

Analysis and applications of nanostructures created by stencil lithography

Vazquez-Mena

Sannomiya

Tosun

et al. 2009

TRANSDUCERS 2009 - 2009 International Solid-State Sensors, Actuators and Microsystems Conference

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Stencil Lithography (SL) is a technique based on shadow mask deposition that does not require any resist processing, energy radiation or chemical solvents. This technique has been used to fabricate sub-micrometric structures, like nanodots [1] and nanowires [2]. It is suitable for patterning on substrates with high topographies, fragile structures and with materials damaged by radiation or solvents. SL also offers the potential for rapid nanopatterning of structures using the stencils several times [3]. However, SL still faces challenges for nanopatterning, like the blurring of the deposited structures due to the stencil-substrate gap [4]. Herein we show advances in the analysis, characterization and application of nanostructures deposited by SL.In this contribution, we present a quantitative study of the blurring as a function of the gap. We show the patterning and electrical characteristics of Au nanowires deposited on polymer substrates by SL. Finally, we present the fabrication of Au nanodots and their use as biosensors based on localized surface plasmon resonance (LSPR) [5]. The stencils used for these experiments consist on silicon wafers with 100 nm thick low stress silicon nitride membranes containing nanoapertures.The blurring in SL is due to the gap between stencil and substrate. To study this relation, we fabricated stencils with membranes having steps (with apertures) as shown in Figure 1.a. This allows us to have different and controlled gaps in a single evaporation with the same stencil. By depositing 60 nm of Al through nanoslits located at different steps of the membranes, nanowires were formed on the substrate. and thickness, are plotted as a function of the gap in Figure 1.f. It can be observed that for a gap of ~40µm, the blurring is about 80nm and the thickness reduced to ~50% of the nominal deposited thickness.Using normal stencils (flat membranes), we have created nanowires (NW) and nanodot arrays. By depositing 45nm of Au through stencils containing nanoslits, we fabricated Au NWs on different polymer substrates: polyimide (PI), parylene and SU-8. The nanowires are deposited between predeposited Au electrodes to allow electrical measurements. We obtained wires up to 20µm long and 80nm wide as illustrated in Figure 2. The resistance as a function of width is shown in Figure 3. The resistivity obtained is ~10 µΩcm for parylene and SU-8, and ~7.5µΩcm for PI. These values are higher than bulk value (2.5µΩcm) due to size effects (grain and surface scattering).We also used stencils with 50nm diameter holes to deposit arrays of 65nm diameter, 80nm thick Au nanodots ( Figure 4.a and b). The total size of the array is ~20µm. We measured the extinction spectra due to LSPR (Figure 4.c) for arrays with different spacing between the nanodots, showing a resonance peak at 800nm. These structures were used to perform biosensing measurements based on the shift of the LSPR peak when biomolecules are added to metallic nanostructures. As expected, Figure 4.d shows a peak shift when biotin (PLL-PEG-biotin) ...

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Predicting mask distortion, clogging and pattern transfer for stencil lithography

Cited by 42 publications

References 30 publications

High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

High resolution fabrication of nanostructures using controlled proximity nanostencil lithography

Metallic Nanowires by Full Wafer Stencil Lithography

Analysis and applications of nanostructures created by stencil lithography

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