Prediction of MEEF using a simple model and MEEF enhancement parameters

Chung, Dong-Hoon; Yang, Seung-Hune; Kim, Hyung-Do; Shin, In-Gyun; Kim, Yong‐Hoon; Choi, Seong-Woon; Han, Woo-Sung; Sohn, Jung Min

doi:10.1117/12.438343

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2019

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“…Therefore, we will discuss specific details of the technical description for solution [3] in the next session.…”

Section: Back Groundmentioning

confidence: 99%

55‐2: Essential Mask Quality for High‐End Resolution Displays

Kim¹,

Choi²,

Hur³

et al. 2019

Symp Digest of Tech Papers

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This paper proposes a best practice to produce the photomasks with the state-of-the-art quality, suitable for high resolution panel patterning. In order to extend the panel patterning process capability, high CD performance (Resolution, CD MTT and CD Uniformity) of photomask is essential and RET(Resolution Enhancement Technology) such as PSM, OPC and OAI will be prominent technology for mask business. PSM and OPC technology on RET will be new challenges for future high resolution panel. These challenges require new generation photomask writer, PSM manufacturing capability.

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“…Therefore, we will discuss specific details of the technical description for solution [3] in the next session.…”

Section: Back Groundmentioning

confidence: 99%