1994
DOI: 10.1016/0167-2738(94)90272-0
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Preferential local dissolution of indented silicon {111} surface by aqueous solutions of HF with varying pH

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Cited by 9 publications
(2 citation statements)
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“…56,57 The current system is chemically similar to electrochemical dissolution of Si in aqueous HF to form porous Si, although the chemical reaction mechanism involved in porous Si formation has been less thoroughly studied. Several competing mechanisms have been proposed for porous Si formation, although two are most commonly cited.…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…56,57 The current system is chemically similar to electrochemical dissolution of Si in aqueous HF to form porous Si, although the chemical reaction mechanism involved in porous Si formation has been less thoroughly studied. Several competing mechanisms have been proposed for porous Si formation, although two are most commonly cited.…”
Section: Resultsmentioning
confidence: 99%
“…However, this conclusion is in disagreement with recent results for Si dissolution into HF, which conclude on the basis of solution phase equilibria that HF 2 Ϫ is the active species. 56,57 The current system is chemically similar to electrochemical dissolution of Si in aqueous HF to form porous Si, although the chemical reaction mechanism involved in porous Si formation has been less thoroughly studied. Several competing mechanisms have been proposed for porous Si formation, although two are most commonly cited.…”
Section: Resultsmentioning
confidence: 99%