2013
DOI: 10.1186/1556-276x-8-62
|View full text |Cite
|
Sign up to set email alerts
|

Preferentially oriented BaTiO3 thin films deposited on silicon with thin intermediate buffer layers

Abstract: Barium titanate (BaTiO3) thin films are prepared by conventional 2-methoxy ethanol-based chemical solution deposition. We report highly c-axis-oriented BaTiO3 thin films grown on silicon substrates, coated with a lanthanum oxynitrate buffer layer of 8.9 nm. The influence of the intermediate buffer layer on the crystallization of BaTiO3 film is investigated. The annealing temperature and buffer layer sintering conditions are optimized to obtain good crystal growth. X-ray diffraction measurements show the growth… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

4
15
0

Year Published

2015
2015
2024
2024

Publication Types

Select...
8
1

Relationship

1
8

Authors

Journals

citations
Cited by 34 publications
(19 citation statements)
references
References 21 publications
4
15
0
Order By: Relevance
“…The c‐axis orientation could, however, be maintained by applying slower ramp rates (below < 5 °C min –1 ). The as‐deposited films show a dielectric constant of 660, which is very consistent with other research on BaTiO 3 thin films . No visible hysteresis on the C‐V‐curves was observed, possibly due to the very low coercive field and thickness of the film.…”
Section: The Current Toolboxsupporting
confidence: 89%
“…The c‐axis orientation could, however, be maintained by applying slower ramp rates (below < 5 °C min –1 ). The as‐deposited films show a dielectric constant of 660, which is very consistent with other research on BaTiO 3 thin films . No visible hysteresis on the C‐V‐curves was observed, possibly due to the very low coercive field and thickness of the film.…”
Section: The Current Toolboxsupporting
confidence: 89%
“…These phases could be attributed to the incorporation of a small amount of BGT with the substrate which due the diffusion of silicon into BGT films arise very fast at high-temperature heating process and formed interfacial silicate [19]. However, the formation of Fresnoite peak can be avoided by growing a thicker layer of buffer layer [20].…”
Section: Resultsmentioning
confidence: 99%
“…However, in each case the Pockels coefficient of the resulting film was strongly degraded. An alternative approach was proposed in [16], relying on the use of a thin spin-coated lanthanide buffer layer on which the BTO layer is deposited using a sol-gel method. The transparent buffer layer can induce a preferential orientation in the BTO-layer.…”
Section: Integration With Ferro-electric Materialsmentioning
confidence: 99%