For
the integration of two-dimensional (2D) transition metal dichalcogenides
(TMDC) with high-performance electronic systems, one of the greatest
challenges is the realization of doping and comprehension of its mechanisms.
Low-temperature atomic layer deposition of aluminum oxide is found
to n-dope MoS2 and ReS2 but not WS2. Based on electrical, optical, and chemical analyses, we propose
and validate a hypothesis to explain the doping mechanism. Doping
is ascribed to donor states in the band gap of Al
x
O
y
, which donate electrons or
not, based on the alignment of the electronic bands of the 2D TMDC.
Through systematic experimental characterization, incorporation of
impurities (e.g., carbon) is identified as the likely cause of such
states. By modulating the carbon concentration in the capping oxide,
doping can be controlled. Through systematic and comprehensive experimental
analysis, this study correlates, for the first time, 2D TMDC doping
to the carbon incorporation on dielectric encapsulation layers. We
highlight the possibility to engineer dopant layers to control the
material selectivity and doping concentration in 2D TMDC.