Preparation and characterisation of a-C and a-C:H coatings deposited by pulsed magnetron sputtering

Czyżniewski, A.

doi:10.1016/j.surfcoat.2008.09.027

Cited by 33 publications

(30 citation statements)

References 36 publications

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“…The development of a suitable deposition method to produce a-CH x coatings directed to a specific application has been one of the main current goals of investigation. Among the well established systems of a-CH x deposition, we can find plasma-enhanced chemical vapour deposition [6], ion beam deposition [7], pulsed laser ablation [8] or magnetron sputtering [9].…”

Section: Introductionmentioning

confidence: 99%

“…Deposition of a-C:H x coatings by magnetron discharge have been studied because such technology is suitable for many industrial applications [9][10][11]. An improvement of the process can be achieved through a pulsed configuration and the use of graphite targets with an hydrocarbon gas precursor [9,12].…”

Section: Introductionmentioning

confidence: 99%

“…An improvement of the process can be achieved through a pulsed configuration and the use of graphite targets with an hydrocarbon gas precursor [9,12]. However, the effect of the predominant growth processes on the obtained microstructure of the a-CH x material, in a basic pulsed magnetron sputtering deposition, has not been completely understood.…”

Section: Introductionmentioning

confidence: 99%

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Investigation of the Growth Mechanisms of a-CH_x Coatings Deposited by Pulsed Reactive Magnetron Sputtering

et al. 2012

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The study of the growth mechanisms of amorphous hydrogenated carbon coatings (a-CH x ) deposited by reactive pulsed magnetron discharge in Ar+C 2 H 2 , Ar+H 2 and Ar+C 2 H 2 +H 2 low pressure atmospheres is presented in this work. Hydrogen-containing species of the reactant gas affect the microstructure and surface properties of the a-CH x thin films. The dynamic scaling theory has been used to relate the main reactive species involved in the deposition process to the growth mechanisms of the thin film by means of the analysis of the roughness evolution. Anomalous scaling effects have been observed in the smooth a-CH x coatings. Dynamic scaling exponents α, β and z indicate a general growth controlled by surface diffusion mechanisms. Hydrogen species have an influence on the lateral growth of the a-CH x coatings and are involved in the development of a polymeric-like structure. Meanwhile, hydrocarbon species promote the generation of 2 higher aggregates that increases the roughness of a more sp 2 clustering structure of the aa-CH x coating.

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Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

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Investigation of the Growth Mechanisms of a-CH_x Coatings Deposited by Pulsed Reactive Magnetron Sputtering

et al. 2012

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“…The Cr 23 C 6 are characterized by high hardness (Vicker's micro-hardness of 976 MPa), while pure a-C:H had a much lower hardness (750 MPa) [17][18][19][20][21]. In majority, it is characterized by sp 2 bonds [22].…”

Section: Localized Corrosion Experimentsmentioning

confidence: 99%

Microstructure characterization of localized corrosion wear of Cr/Cr2N+ a-C:H/a-C:H:Cr multilayer coatings on carbon fiber composites

Janusz¹,

Major²,

Lackner³

et al. 2017

Bulletin of the Polish Academy of Sciences Technical Sciences

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Abstract. The use of carbon fiber composites (CFC) for different applications is widespread. Carbon-based materials show, however, significant oxidative degradation in air. Modern materials are subjected to aggressive, corrosive environment. This type of environment may strongly reduce their mechanical properties. For the protection of CFC, it was necessary to apply coatings to the composite surface. In the presented paper, a chromium/chromium nitride (Cr/Cr2N) multilayer structure has been selected as the inner part. The outer part of the coating was a hydrogenated amorphous carbon (a-C:H), gradually implanted by Cr nanocrystals. The application of transmission electron microscopy (TEM) indicated that the proposed deposition method allowed the formation of a Cr/Cr2N multilayer of Λ = 150 nm, topped with a-C:H+ Cr23C6 composite of a varied carbides density. The micro-hardness of the deposited coatings was up to 14 GPa (at a load of 2 and 5 mN). The microstructure of the deposited coatings was described in detail by means of TEM in the authors' recently published paper [1]. This paper is a continuation thereof, aimed at describing microstructure changes after a localized corrosion process. In order to study localized corrosion in coatings, particularly in metallic (Cr) interlayers, the potential measurements and voltammetry experiments were performed in a Ringer solution. The open-circuit potential reaches stable values after a sufficient time period. The results indicated that the presence of a-C:H+Cr23C6, the outer part of the coating, speeds up the localized corrosion process in Cr interlayers in the inner part of a coating.

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“…Hydrogenated amorphous carbon films prepared with MFPUMST by Freyman et al [7] was studied for their friction property. Czyzniewski [8] using this method investigated the influence of acetylene flow rate on mechanical properties of DLC films. Yang et al, [9] along with it, studied the effects of substrate bias voltage on the mechanical properties of coatings.…”

Section: Introductionmentioning

confidence: 99%

Effects of sputtering current on the bonding structure and mechanical properties of diamond‐like carbon films deposited by MFPUMST

Dai

Jiang

Zhan

et al. 2009

Surface & Interface Analysis

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Diamond-like carbon (DLC) films on glass wafers were produced by middle frequency pulsed unbalanced magnetron sputtering technique (MFPUMST) at different sputtering current. The chemical bonding of carbon characterized by Raman spectroscopy and X-ray photoelectron spectroscopy (XPS) show that the sp 3 fraction in DLC films increases with increasing sputtering current from 100 to 300 mA, and then decreases above 300 mA. Mechanical properties like nano-hardness and elastic recovery for these films under different sputtering currents analyzed by a nano-indentation technique show the same tendency that nanohardness and elastic recovery increase with increasing sputtering current from 100 to 300 mA, and then decrease with increasing sputtering current from 300 to 400 mA. These results indicate that the sp 3 fraction in the prepared DLC films is directly related to nano-hardness and elastic recovery. The results shown above indicate that the parameter of the preparation -sputtering current has a strong influence on the bonding configuration of the deposited DLC films. The mechanism of sputtering current on the sp 3 fraction is discussed in this paper.

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Preparation and characterisation of a-C and a-C:H coatings deposited by pulsed magnetron sputtering

Cited by 33 publications

References 36 publications

Investigation of the Growth Mechanisms of a-CH_x Coatings Deposited by Pulsed Reactive Magnetron Sputtering

Investigation of the Growth Mechanisms of a-CH_x Coatings Deposited by Pulsed Reactive Magnetron Sputtering

Microstructure characterization of localized corrosion wear of Cr/Cr2N+ a-C:H/a-C:H:Cr multilayer coatings on carbon fiber composites

Effects of sputtering current on the bonding structure and mechanical properties of diamond‐like carbon films deposited by MFPUMST

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Preparation and characterisation of a-C and a-C:H coatings deposited by pulsed magnetron sputtering

Cited by 33 publications

References 36 publications

Investigation of the Growth Mechanisms of a-CHx Coatings Deposited by Pulsed Reactive Magnetron Sputtering

Investigation of the Growth Mechanisms of a-CHx Coatings Deposited by Pulsed Reactive Magnetron Sputtering

Microstructure characterization of localized corrosion wear of Cr/Cr2N+ a-C:H/a-C:H:Cr multilayer coatings on carbon fiber composites

Effects of sputtering current on the bonding structure and mechanical properties of diamond‐like carbon films deposited by MFPUMST

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Investigation of the Growth Mechanisms of a-CH_x Coatings Deposited by Pulsed Reactive Magnetron Sputtering

Investigation of the Growth Mechanisms of a-CH_x Coatings Deposited by Pulsed Reactive Magnetron Sputtering