2001
DOI: 10.1016/s0025-5408(01)00509-8
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Preparation and characterization of Bi2S3 thin films using modified chemical bath deposition method

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Cited by 53 publications
(22 citation statements)
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“…The decrease in film thickness beyond the final thickness in Fig. 2 is due to film dissolution, similar to that reported by others [24]. The XRD pattern as shown in Fig.…”
Section: Discussionsupporting
confidence: 89%
“…The decrease in film thickness beyond the final thickness in Fig. 2 is due to film dissolution, similar to that reported by others [24]. The XRD pattern as shown in Fig.…”
Section: Discussionsupporting
confidence: 89%
“…The observed XRD peak positions in the unirradiated Bi 2 S 3 film indicate that it crystallizes in the orthorhombic structure (Ahire et al, 2001). In case of film irradiated at a dose of 20 kGy, initially the peaks are sharper.…”
Section: Resultsmentioning
confidence: 88%
“…Толщины t пленок CuI определяли гравиметриче-ски [32] в предположении, что плотность пленок со-ответствовала плотности массивного материала иодида меди 5.67 г/см 3 . С целью анализа кристаллической структуры на-ноструктурированных массивов ZnO и пленок CuI исследовали рентгеновские спектры образцов (XRD), которые регистрировали с помощью дифрактометра • к их поверхно-сти через теневую маску.…”
Section: методика экспериментаunclassified