1993
DOI: 10.1016/0921-4534(93)90759-j
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Preparation and characterization of Bi2Sr2Ca1Cu2O8+ thin films made by LPVD

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Cited by 24 publications
(10 citation statements)
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“…Several techniques have been employed to grow Bi-2212 films including magnetron sputtering [6], metalorganic chemical vapor deposition (MOCVD) [7], molecular beam epitaxy [8], liquid phase epitaxy [9] and pulsed laser deposition (PLD) [10]. In recent years, PLD has been the preferred method to produce films of Bi-2212.…”
Section: Introductionmentioning
confidence: 99%
“…Several techniques have been employed to grow Bi-2212 films including magnetron sputtering [6], metalorganic chemical vapor deposition (MOCVD) [7], molecular beam epitaxy [8], liquid phase epitaxy [9] and pulsed laser deposition (PLD) [10]. In recent years, PLD has been the preferred method to produce films of Bi-2212.…”
Section: Introductionmentioning
confidence: 99%
“…x /normal metal (Au, In) and Βi2 Sr2 CaCu 2 O8+y /Au point contact and planar junctions. The YBaCuO and BSCCO thin films were prepared by laser ablation on SrΤiO 3 substrate [8,9]. Point contact junctions at various temperatures (4.2 ¸ 300 K) were prepared.…”
Section: Methodsmentioning
confidence: 99%
“…This process is either performed in-situ or ex-situ and part of the post heat treatment [4,18]. These results implies that post heat treatment is necessary to homogenize the composition of the film and improve the critical temperarure T c [1,4,19] only about 58 K and for Bi-22Y2, the highest T c is 90.5 K at 25% Y concentration [9,10]. Y substituted Bi-2212 films grown by IR PLD show drop in magnetoresistance and improved critical current density J c [3].…”
Section: Introductionmentioning
confidence: 99%
“…In UV PLD of Bi-Sr-Ca-Cu-O films, the substrates are usually heated to 800 0 C followed by in-situ and ex-situ post heat treatments in gas atmospheres [1,13,22,29]. Reports have shown that Bi-content of the film is greatly influenced by the substrate temperature and can be highly deficient at higher temperatures [1,29].…”
Section: Introductionmentioning
confidence: 99%
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