2022
DOI: 10.26565/2312-4334-2022-4-19
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Preparation and Characterization of Cu2CrSnS4 Thin Films Deposited at Different Temperatures

Abstract: In this study, Cu2CrSnS4 thin films are prepared using chemical pyrolysis technique at various deposition temperatures (200, 250, 300, 350, 400 and 450 °C) and without any annealing process. The structure characteristics of the films have been studied by X ray diffraction (XRD), micro-Raman spectroscopy, and Field Emission Scanning Electron Microscope (FESEM), while the optical characteristics are investigated by UV-Visible spectrophotometry, and the electrical properties aree described by Hall Effect test. Re… Show more

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