2009
DOI: 10.1088/1464-4258/11/2/024012
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Preparation and characterization of Irgacure 784 doped photopolymers for holographic data storage at 532 nm

Abstract: This paper presents the development of a thick photopolymer for holographic data storage at a wavelength of 532 nm. Irgacure 784, one kind of the titanocene photoinitiators, has been selected and doped to synthesize the photopolymers in this research. Using a two-step thermo-polymerization procedure two photopolymer samples have been fabricated, Irgacure 784 doped poly(methyl methacrylate) (PMMA) and Irgacure 784 doped epoxy resin. Samples of 2 mm thick have been fabricated. Holographic measurements show that … Show more

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Cited by 37 publications
(18 citation statements)
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“…These mechanisms can include the generation of photoproducts, which absorb at the exposing wavelength, and also the production of other transient initiator states [15][16][17]. However, for the short holographic exposures (Յ5 s exposure), which are examined in this paper, it is assumed that the simple theoretical model used in the absorption analysis of the AA/PVA system is sufficiently valid in order to estimate the rate of generation of primary radicals R i ͑x , t͒ in the epoxy resin case.…”
Section: Absorptionmentioning
confidence: 99%
“…These mechanisms can include the generation of photoproducts, which absorb at the exposing wavelength, and also the production of other transient initiator states [15][16][17]. However, for the short holographic exposures (Յ5 s exposure), which are examined in this paper, it is assumed that the simple theoretical model used in the absorption analysis of the AA/PVA system is sufficiently valid in order to estimate the rate of generation of primary radicals R i ͑x , t͒ in the epoxy resin case.…”
Section: Absorptionmentioning
confidence: 99%
“…Lin et al [71] fabricated two photopolymer samples, Irgacure 784 doped poly(methyl methacrylate) (PMMA) and Irgacure 784 doped epoxy resin, using a two-step thermopolymerization procedure. Comparing the experimental results for Irgacure 784/PMMA to those produced using PQ/PMMA, the M# was improved by a factor of 1.9, and the sensitivity has been improved by a factor of 10.…”
Section: Physics Research Internationalmentioning
confidence: 99%
“…3,10,14,[17][18][19][20] In this study we follow Ref. 19 and assume that isomerization takes place before the photocleaving of the generated isomer.…”
Section: The Chemistry Of Photoinitiationmentioning
confidence: 99%
“…Their inexpensive, self-processing capability and low loss make them promising materials for a variety of applications. [1][2][3][4][5][6][7][8][9][10][11][12] In order to reach their full potential, accurate material models based on reproducible experimental data sets will be necessary. In particular, such models are needed to identify and permit optimization of crucial operational parameters.…”
Section: Introductionmentioning
confidence: 99%
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