1987
DOI: 10.1007/bf00682660
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Preparation and characterization of MoC x thin films

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Cited by 11 publications
(6 citation statements)
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“…The large (a = 0.6 nm) lattice parameter indicates that the atoms are located in the most dense 111 plane of a cubic B1 type lattice with the lattice parameter a = a0√2. B1 lattice is typical for the -MoC phase [15] with a lattice constant a0 = 0.42 nm, identified by XRD measurements on thicker films. STM measurements on both sets of thin films revealed rms roughness of 0.6-0.7 nm.…”
Section: Resultsmentioning
confidence: 92%
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“…The large (a = 0.6 nm) lattice parameter indicates that the atoms are located in the most dense 111 plane of a cubic B1 type lattice with the lattice parameter a = a0√2. B1 lattice is typical for the -MoC phase [15] with a lattice constant a0 = 0.42 nm, identified by XRD measurements on thicker films. STM measurements on both sets of thin films revealed rms roughness of 0.6-0.7 nm.…”
Section: Resultsmentioning
confidence: 92%
“…Single atoms ejected from the surface of molybdenum target react with carbon atoms within the acetylene molecules and the product is subsequently deposited on the substrate. The superconducting properties of MoCx samples strongly depend on the carbon concentration [15]. Varying the acetylene pressure at the sputtering we tuned the carbon concentration and obtained samples with the highest possible Tc.…”
Section: Methodsmentioning
confidence: 99%
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“…In addition, stable crystalline molybdenum carbide films prepared by chemical vapor deposition (CVD) and physical vapor deposition (PVD) have been found to contain either Mo 2 C and/or the δ-MoC 1−x phase. 45,46,47,48 Hence it seems plausible that both the O-covered Cterminated α-Mo 2 C(100) and the δ-MoC(100) surfaces may be stable at relevant steam reforming conditions, however, further studies are needed.…”
Section: Discussionmentioning
confidence: 99%
“…MoC films of 3 nm thickness were prepared by the reactive magnetron sputtering onto a Si substrate as described in [12,13]. The Ioffe-Regel parameter kFl was determined for all our thin MoC films [6,12] from the free-electron-model.…”
mentioning
confidence: 99%