Preparation and characterization of photoreactive copolymers containing curable pendants for positive photoresist

Liu, Jui‐Hsiang; Lin, Seng‐Hei; Shih, Jen‐Chieh

doi:10.1002/1097-4628(20010418)80:3<328::aid-app1103>3.3.co;2-a

Cited by 3 publications

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“…Cross-linked polymers obtained by simultaneous polymerization/cross-linking of monomers containing multiple double bonds find a wide range of applications, such as ion exchange resins, adsorbents, molecularly imprinted polymers, supports for reagents in organic synthesis, enzyme immobilization, and drug delivery systems. A sequential approach wherein a soluble linear polymer is first synthesized, isolated, condensed with a functional monomer, and then cross-linked offers significant advantages. 1a-c Soluble linear poly(ethylene glycol dimethacrylate), that is, poly(EGDMA), containing pendant unsaturation could be obtained by esterifying poly(methacrylic acid) with 2-hydroxyethyl methacrylate (HEMA). However, it is not clear if complete conversion could be achieved without cross-linking or homopolymerization of HEMA.…”

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confidence: 99%

Formation of Linear Polymers with Pendant Vinyl Groups via Inclusion Complex Mediated Polymerization of Divinyl Monomers

et al. 2006

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Ethylene glycol dimethacrylate (EGDMA) and ethylene glycol methacrylate 4-vinyl benzoate (EGMAVB) were shown to form 1:1 inclusion complexes with cyclodextrin and were characterized by instrumental techniques. Computational analysis showed that the bent conformation of the included divinyl monomer was more stable than its linear conformation. Complexation of the divinyl monomer with the first CD molecule offered substantial stabilization than with the second CD molecule. The vinyl group included in the CD cavity did not participate in polymerization. As a result, solvent soluble, linear polymers with pendant vinyl unsaturation per repeat unit were obtained. This was unequivocally established by the polymerization of a complex comprising CD and EGMAVB. The unreacted vinyl group can be polymerized in the subsequent step to yield cross-linked products.

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confidence: 99%

Formation of Linear Polymers with Pendant Vinyl Groups via Inclusion Complex Mediated Polymerization of Divinyl Monomers

et al. 2006

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“…Both homopolyesters P1 and P2 revealed a good initial thermal resistance, which may be attributable to the absence of NO 2 and bornyl groups in the side chain. It was found that high steric hindered bornyl groups may increase the glass‐transition temperature ( T g ) of polymers but not the degradation temperature ( T d ) 26, 27. As can be seen in Table III, the existence of NO 2 in pendant groups of P11 and P14 may easily cause an initial thermal degradation from the site.…”

Section: Resultsmentioning

confidence: 99%

Preparation and optical performance of chiral polymers having azobenzene segments

Liu

Yang

2004

J of Applied Polymer Sci

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A series of monomeric azobenzene derivatives of 6-(4-nitro-4Ј-oxy-azobenzene acrylate with carbon numbers of 6 and 11, and the chiral monomer of bornyl 4-(6-acryloyloxyhexyloxy)-phenyl-4Ј-benzoate were synthesized. Chiral polymers having bornyl group end-capped pendants with azobenzene-derived segments were prepared. Molecular structures and polymer compositions were confirmed by using 1 H-NMR, elemental analysis, FTIR, and UV-vis analyzers. Thermodynamic properties of both monomers and polymers were investigated. Specific rotations of chiral monomers and polymers were estimated by using an automatic digital polarimeter. Liquid crystalline textures of monomers and polymers were analyzed by using a polarizing optical microscope and confirmed by a smallangle X-ray analyzer. The optical reflection characteristics of composite cells with chiral nematic liquid crystal and various amounts of azobenzene derivatives were evaluated by using a UV-vis spectrophotometer. The reliability and stability of the composite cells with E48/S811 and azobenzene derivatives were studied. The photoisomerization of the chiral polymer film was investigated by using SEM and AFM analyzers. It was found that the UV irradiation of a laser spot caused the shrinkage of polymer film due to the photoisomerization of azobenzene segments. The contraction of the polymer film can be recovered by heat treatment.

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“…Experimentally, two‐wave synthesis of 2D‐structures was implemented on a lithographic system (Figure ). Strong absorption of UV‐radiation by the medium restricts the thickness of polymer layer and, hence, conventional lithographic systems operate with the layers of 1–100 μm thick . Flat layer of photopolymerizable composition was uniformly exposed to UV‐radiation from the bottom.…”

Section: Main Partmentioning

confidence: 99%

“…Photopolymerizable compositions (PPCs) are widely used in photolithography and jet printing to form polymeric 2D‐ or 3D‐structures. Besides the classical version of inhomogeneous photopolymerization of a PPC layer with a single source of light, two‐wavelength processes have recently been implemented .…”

Section: Introductionmentioning

confidence: 99%

Use of photodegradable inhibitors in UV‐curable compositions to form polymeric 2D‐structures by visible light

Mensov

Абакумов

Arsenyev

et al. 2020

J of Applied Polymer Sci

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The process of two‐wave photopolymerization of a UV‐curable composition with an optically degrading inhibitor is considered. By numerical simulation, it is shown that in the composition layer uniformly exposed to UV‐radiation, such systems allow getting segments with different conversion under the action of inhomogeneous visible light. Based on the data on the photopolymerization kinetics of the compositions from triethylene glycol dimethacrylate (TEGDMA) and bisphenol‐A glycidyl dimethacrylate (bis‐GMA) with the UV‐initiator 2,2‐dimethoxy‐2‐phenylacetophenone (DMPA), it was shown that 3,5‐di‐tert‐butyl‐o‐benzoquinone (35Q) with N,N‐dimethylaniline (DMA, “Aldrich”, 99%) can serve as an inhibitor that degrades under action of visible radiation. Combining inhomogeneous visible light generated with a conventional DLP‐projector and uniform UV‐radiation of LED (365 nm) the two‐wave lithographic process was implemented to create polymeric 2D‐structures in 20 μm layer of the compositions from TEGDMA (70)/bis‐GMA (30)/DMPA (0.05 wt%)/35Q (0.5 wt%)/DMA (1 wt%).

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Preparation and characterization of photoreactive copolymers containing curable pendants for positive photoresist

Cited by 3 publications

References 0 publications

Formation of Linear Polymers with Pendant Vinyl Groups via Inclusion Complex Mediated Polymerization of Divinyl Monomers

Formation of Linear Polymers with Pendant Vinyl Groups via Inclusion Complex Mediated Polymerization of Divinyl Monomers

Preparation and optical performance of chiral polymers having azobenzene segments

Use of photodegradable inhibitors in UV‐curable compositions to form polymeric 2D‐structures by visible light

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