Preparation and characterization of transparent TiO2 thin films coated on fused-silica substrates

Yu, Hsuan‐Fu; Hu, Fa-Chun

doi:10.1007/s10971-009-2005-3

Cited by 10 publications

(10 citation statements)

References 22 publications

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“…8 Aside from being an attractive choice for a high-k dielectric, TiO 2 has a wide variety of applications such as dye-sensitized solar cells, 9 gas sensors, 10 and photocatalysis. 11 Generally, crystalline TiO 2 exists in three polymorphic modificationsanatase, rutile, and brookitethat have different dielectric constants. Anatase has a dielectric constant of around 40 whereas rutile's dielectric constant is about 80, although there is a large variation in these values depending on synthesis method and geometry.…”

Section: ■ Introductionmentioning

confidence: 99%

Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition

Schindler¹,

Logar

Provine³

et al. 2015

Langmuir

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Plasma-enhanced atomic layer deposition (PEALD) provides multiple benefits compared to thermal ALD including lower possible process temperature and a wider palette of possible materials. However, coverage of high aspect ratio (AR) structures is limited due to the recombination rates of the radical plasma species. We study the limits of conformality in 1:30 AR structures for TiO2 based on tetrakis(dimethylamido)titanium (TDMA-Ti) and O2 plasma through variation in plasma exposure and substrate temperature. Extending plasma exposure duration and decreasing substrate temperature within the ALD window both serve to improve the conformality of the deposited film, with coverage >95% achievable. Additionally, the changes in morphology of the TiO2 were examined with crystallites of anatase and brookite found.

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Section: ■ Introductionmentioning

confidence: 99%

Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition

Schindler¹,

Logar

Provine³

et al. 2015

Langmuir

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“…N anocrystalline titanium dioxide (TiO 2 ) films have recently attracted much attention due to their versatility with regard to applications in dye‐sensitized solar cells, 1 gas sensors, 2 and photocatalysts 3 . Because of the high transparency of TiO 2 in the visible and near‐infrared regions of the electromagnetic spectrum (ES), TiO 2 films can be used as antireflection coatings for increasing the visible transmittance in a heat mirror, while the high absorption of UV light, due to high photoactivity of TiO 2 , leads to applications in solar energy conversion 4 …”

Section: Introductionmentioning

confidence: 99%

Nanocrystalline TiO₂ Thin Films Fabricated Via a Polyelectrolyte Multilayer‐Assisted Sol–Gel Reaction

Logar¹,

Jančar²,

Suvorov³

2010

Journal of the American Ceramic Society

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Nanostructured anatase titanium dioxide (TiO2) thin films were fabricated with an in situ, sol–gel process in a self‐assembled, polyelectrolyte multilayer (PEM) template. Because the PEM template is formed by the sequential adsorption of appositively charged, weak polyelectrolytes, polyacrylic acid, and polyallylamine, it contains nonionized carboxylic groups that are able to react with the inorganic precursor, resulting in the formation of an inorganic–organic hybrid network. After annealing, nanocrystalline TiO2 films with a controlled surface morphology, crystallite size, and a thickness on the nanometer scale were obtained. The average TiO2 crystallite size was approximately 10 nm. The surface morphology and the roughness of the nanocrystalline films were evaluated by field‐emission scanning electron microscopy and atomic force microscopy. UV‐vis spectroscopy was used to establish the optical parameters of the nanocrystalline TiO2 films. The as‐fabricated, nanostructured TiO2 films showed high absorption in the UV region and the controlled transmission of visible light.

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“…Although the TiO 2 thin films were calcined at different temperature, the thickness of all the films was around 80 nm, and therefore showed transparent characteristics. The photocatalytic results also showed that the TiO 2 films prepared at 600 and 800 • C possess the highest photocatalytic ability, owing to coarsening, crystal growth and spheroidizing of the TiO 2 grains in the films [54].…”

Section: Introductionmentioning

confidence: 88%

“…Also due to the fact that films are easier to be synthesized and used, researchers usually choose such planar structures to examine the relationship between the crystal structure and photocatalytic property. For example, Yu and Hu investigated the relationship between the temperature-affected crystal structure and photocatalytic activities, finding that the anatase crystallites grow in size linearly with calcination temperature ranging from 600 to 1200 • C, and the TiO 2 films prepared at 600-800 • C possess higher photocatalytic ability than those prepared at 1000-1200 • C [54]. Therefore, zero-dimensional planar bulk film or membrane provides a great contribution from fundamental researches of element-doping and crystal morphology of photocatalytic semiconductors to commercial products [67][68][69].…”

Section: Introductionmentioning

confidence: 99%

Nano-/microstructure improved photocatalytic activities of semiconductors

Zhao

Jiang

2013

Phil. Trans. R. Soc. A.

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Photocatalysis has emerged as a promising technique owing to its valuable applications in environmental purification. With the demand of building effective photocatalyst materials, semiconductor investigation experienced a developing process from simple chemical modification to complicated morphology design. In this review, the general relationship between morphology structures and photocatalytic properties is mainly discussed. Various nano-/microsized structures from zero-to three-dimensional are discussed, and the photocatalytic efficiency correspon-ding to the structures is analysed. The results showed that simple structures can be easily obtained and can facilitate chemical modification, whereas one-or three-dimensional structures can provide structureenhanced properties such as surface area increase, multiple reflections of UV light, etc. Those principles of structure-related photocatalytic properties will afford basic ideology in designing new photocatalytic materials with more effective catalytic properties.

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Preparation and characterization of transparent TiO2 thin films coated on fused-silica substrates

Cited by 10 publications

References 22 publications

Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition

Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition

Nanocrystalline TiO₂ Thin Films Fabricated Via a Polyelectrolyte Multilayer‐Assisted Sol–Gel Reaction

Nano-/microstructure improved photocatalytic activities of semiconductors

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Preparation and characterization of transparent TiO2 thin films coated on fused-silica substrates

Cited by 10 publications

References 22 publications

Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition

Enhanced Step Coverage of TiO2 Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition

Nanocrystalline TiO2 Thin Films Fabricated Via a Polyelectrolyte Multilayer‐Assisted Sol–Gel Reaction

Nano-/microstructure improved photocatalytic activities of semiconductors

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Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition

Enhanced Step Coverage of TiO₂ Deposited on High Aspect Ratio Surfaces by Plasma-Enhanced Atomic Layer Deposition

Nanocrystalline TiO₂ Thin Films Fabricated Via a Polyelectrolyte Multilayer‐Assisted Sol–Gel Reaction