Preparation and Formation Mechanism of Highly Dispersed Manganese Silicide on Silica by MOCVD of Mn(CO)₅SiCl₃

Abstract

MnSi nanoparticles on silica are prepared by metal-organic (MO)CVD of Mn(CO) 5 SiCl 3 as a single-source precursor. Mn(CO) 5 SiCl 3 is synthesized from Mn 2 (CO) 10 and SiHCl 3 using standard Schlenk techniques, and confirmed by Fourier transform infrared (FTIR), single-crystal X-ray diffraction (XRD), and 13 C and 29 Si nuclear magnetic resonance (NMR). Powder XRD patterns, high resolution transmission electron microscopy (HRTEM), elemental maps, and energy dispersive Xray (EDX) spectroscopy show that MnSi particles, with a size of about 5-6 nm, are uniformly dispersed on the silica support. The formation mechanism of MnSi nanoparticles on silica is investigated by in-situ FTIR spectroscopy. The results demonstrate the formation details of MnSi nanoparticles from Mn(CO) 5 SiCl 3 through the elimination of carbonyl groups and dissociation of SiÀCl bonds with the promotion of H 2 .

CVD of Pt(C5H9)2 to Synthesize Highly Dispersed Pt/SBA‐15 Catalysts for Hydrogenation of Chloronitrobenzene

“…In the previous study by Zhang et al Pd@MOF‐5 catalysts were synthesized by MOCVD of Pd(C 3 H 5 )(C 5 H 5 ) as single‐source precursor, and showed good activity for the Suzuki coupling reaction. Guan et al synthesized highly dispersed manganese silicide on silica by MOCVD of Mn(CO) 5 SiCl 3 . The key idea of the present work was to synthesize a novel platinum metal‐organic precursor that can be reduced to Pt nanoparticles under mild conditions with hydrogen.…”