Preparation and Optical Properties of TiO2/SiO2 bilayer antireflection film

Zhao, Leran; Zhao, Changjiang; Wang, Luoshu; Fan, Xiaowei; Wang, Qingguo; Liu, Juncheng

doi:10.1016/j.optmat.2021.111594

Cited by 11 publications

(5 citation statements)

References 34 publications

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“…The kinetic energy particles sputtered by high-energy ions bombarding the target provide the driving force for the atomic diffusion on the film's surface [32]. When other sputtering conditions are the same, the lower the sputtering power is, the worse the migration and diffusion of particles are, and the gullies on the surface of the film layer are not filled.…”

Section: Effect Of the Sputtering Power On The Surface Morphology Of ...mentioning

confidence: 99%

Effect of magnetron sputtering power on the properties of the AlO _X monolayer and AlO _X /MgF₂ bilayer anti-reflection films

Song,

Zhao,

Zhao

et al. 2024

J. Phys. D: Appl. Phys.

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The AlO X monolayer anti-reflection (MLAR) films and the AlO X /MgF2 bilayer anti-reflection (BLAR) films were deposited on high-purity glasses with magnetron sputtering. We investigated the influences of sputtering power on the O/Al molar ratio, microstructure, and optical properties of the AlO X MLAR films and AlO X /MgF2 BLAR films. The results showed that a too high or a too low sputtering power was detrimental to the preparation of the high-quality films, which could only be obtained when the sputtering power was 115 W. However, the sputtering power did not affect the crystallinity of the films, all of which were amorphous. When the sputtering power was 115 W, the high-purity AlO X MLAR film exhibited an O/Al molar ratio of 2.27:1, a refractive index of 1.426, and an average transmittance (T avg: average transmittance of the quartz glass deposited the film, hereinafter the same) of 94.03% within 300–1100 nm wavelength range. The T avg of AlO X /MgF2 BLAR film with a power of 115 W was 94.99%, which was 1.92% higher than that of the glass substrate. And it improved the cell’s photoelectric conversion efficiency (PCE) by 3.19%.

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Section: Effect Of the Sputtering Power On The Surface Morphology Of ...mentioning

confidence: 99%

Effect of magnetron sputtering power on the properties of the AlO _X monolayer and AlO _X /MgF₂ bilayer anti-reflection films

Song,

Zhao,

Zhao

et al. 2024

J. Phys. D: Appl. Phys.

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“…Therefore, the samples show high transparency in the visible region. The refractive index of the films was computed with the following relation [42]: Sn/ZnO thin films can make them appropriate for optoelectronic applications [43]. The refractive index values of all samples decrease with increasing wavelength from the absorption edge to lower energies.…”

Section: Refractive Index and Extinction Coefficientmentioning

confidence: 99%

“…The samples have different refractive indexes at various wavelengths.Their values at the absorption edge for samples S1-S5 are 2.23, 2.25, 2.27, 2.28, and 2.29, respectively. The high refractive index of the In 2 O 3 : Sn/ZnO thin films can make them appropriate for optoelectronic applications[43]. The refractive index values of all samples decrease with increasing wavelength from the absorption edge to lower energies.…”

mentioning

confidence: 99%

Correlation between the optical and microstructural characteristics and surface wettability transition of In₂O₃:Sn/ZnO nanostructured bilayer system for self-cleaning application

Soltanian,

Ghasemi,

Eftekhari

et al. 2023

Phys. Scr.

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In this research, in the Glass/In2O3: Sn/ZnO nanostructured bilayers system, In2O3: Sn and ZnO thin films were deposited onto glass using thermal evaporation and spray pyrolysis, respectively. The thin films were annealed at 350, 400‚ 450‚ 500‚ and 550 °C for 90 min. The primitive purpose of this study was to explain the effect of annealing temperature on the wettability, optical, microstructural, and morphological properties of the bilayers using UV–vis spectrophotometer, advanced x-ray diffraction (XDA) analysis, atomic force microscope (AFM), and scanning electron microscope (SEM). Various parameters were determined, including the transmission and reflection coefficients, optical energy band gap, extinction coefficient, refractive index, lattice strain, dislocation density, root mean square roughness, and water contact angle for the samples before UV exposure. The wettability results showed that the hydrophobicity of the In2O3: Sn/ZnO nanostructured thin films without UV radiation was improved by increasing the annealing temperature due to the increase in root mean square (RMS) roughness. Microstructural analysis indicated that increasing the annealing temperature increased crystallite size and decreased the lattice strain. The contact angles of the samples were significantly reduced, and the surface wettability of the layers changed from hydrophobic to hydrophilic after the UV treatment. Finally, the correlation between the optical, microstructural, morphological, and wettability features of the samples was determined. The effective optical band gap was observed to have a linear, inverse square, and quadratic correlation with strain, crystallite size, and dislocation density, respectively.

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“…TiO 2 is one of the most famous photo-activated materials. Owing to its high photocatalytic efficiency, chemical stability, relatively low cost [126], wide transparent region (approximately 350-1200 nm [127]), and refractive index close to that of glass (2.2-2.7 for TiO 2 and 2.1-2.2 for glass) [127,128], TiO 2 is suitable for use as a high refractive index layer in multilayer AR film with self-cleaning properties. A single-component bilayer AR coating of TiO 2 porous nanorods with a low refractive index (1.38) and a TiO 2 dense layer with a high refractive index (2.45) was presented by Khan et al according to the glancing angle deposition technique [129].…”

Section: Ms-made Photocatalytic Multifunctional Coatingsmentioning

confidence: 99%

Transparent Self-Cleaning Coatings: A Review

Xue

et al. 2023

Coatings

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Advanced coatings are essential to modern technologies as they optimise surface characteristics for different application scenarios. Transparent and self-cleaning coatings are increasingly used as protective coatings for various applications, such as foldable touchscreens, windows, and solar panels. Moreover, incorporating other functionalities such as high hardness, wear resistance, and flexibility into transparent and self-cleaning coatings is important for broadening the use cases. Although many kinds of multifunctional coatings have been developed, it is still difficult to embody several properties in one coating adequately as some properties, such as hardness and flexibility, are inherently contrastive. This review first describes basic principles, including wettability, photocatalytic reactions, photo-induced hydrophilic phenomena, and the implication of self-cleaning. The desired properties of multifunctional coatings are then listed and the methods for evaluating different properties are used. Recent progress in various preparation methods for multifunctional coatings, including the sol–gel, dip/spin, and chemical vapour deposition (CVD) methods, are also presented. Magnetron sputtering (MS) technology is widely used in coating preparation. Compared with chemosynthesis and CVD, MS is time-saving, suitable for industrial production, and environmentally friendly. Coatings prepared by MS usually possess excellent mechanical properties. Thus, we highlight the current research status of MS technology in multifunctional coating preparation. Moreover, according to the multilayer design structure of coatings, their optical and mechanical properties and self-cleaning ability can be controlled by combining the characteristics of different materials. Finally, combining photocatalytic materials such as TiO2 with other materials through a multilayer structure to obtain a multifunctional coating with excellent overall properties is discussed.

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Preparation and Optical Properties of TiO2/SiO2 bilayer antireflection film

Cited by 11 publications

References 34 publications

Effect of magnetron sputtering power on the properties of the AlO _X monolayer and AlO _X /MgF₂ bilayer anti-reflection films

Effect of magnetron sputtering power on the properties of the AlO _X monolayer and AlO _X /MgF₂ bilayer anti-reflection films

Correlation between the optical and microstructural characteristics and surface wettability transition of In₂O₃:Sn/ZnO nanostructured bilayer system for self-cleaning application

Transparent Self-Cleaning Coatings: A Review

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Preparation and Optical Properties of TiO2/SiO2 bilayer antireflection film

Cited by 11 publications

References 34 publications

Effect of magnetron sputtering power on the properties of the AlO X monolayer and AlO X /MgF2 bilayer anti-reflection films

Effect of magnetron sputtering power on the properties of the AlO X monolayer and AlO X /MgF2 bilayer anti-reflection films

Correlation between the optical and microstructural characteristics and surface wettability transition of In2O3:Sn/ZnO nanostructured bilayer system for self-cleaning application

Transparent Self-Cleaning Coatings: A Review

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Resources

About

Effect of magnetron sputtering power on the properties of the AlO _X monolayer and AlO _X /MgF₂ bilayer anti-reflection films

Effect of magnetron sputtering power on the properties of the AlO _X monolayer and AlO _X /MgF₂ bilayer anti-reflection films

Correlation between the optical and microstructural characteristics and surface wettability transition of In₂O₃:Sn/ZnO nanostructured bilayer system for self-cleaning application