2002
DOI: 10.1557/jmr.2002.0113
|View full text |Cite
|
Sign up to set email alerts
|

Preparation and oxidation of Al4SiC4

Abstract: Single-phase Al 4 SiC 4 was successfully synthesized by heating the powder mixture of aluminum, silicon, and carbon black in the molar ratio corresponding to the chemical composition of Al 4 SiC 4 with a small amount of triethanolamine (TEA) above 1200°C in argon gas. Without TEA, two phases of Al 4 C 3 and SiC were formed, irrespective of the heating temperature. The marked mass gain by oxidation of Al 4 SiC 4 was observed with forming Al 2 O 3 and SiO 2 in the range of 850 to 1150°C, which slightly increased… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

1
33
0

Year Published

2005
2005
2023
2023

Publication Types

Select...
7
1

Relationship

0
8

Authors

Journals

citations
Cited by 43 publications
(34 citation statements)
references
References 12 publications
1
33
0
Order By: Relevance
“…19) The first step begins with the reduction of SiO2 by carbon sources to generate SiO gas as shown in reaction (6) at the interface between SiO2 and C particles, which is an initial and endothermic reaction. (6) Once CO gas is formed as a by-product, SiO can also be generated according to exothermic reaction (7).…”
Section: Resultsmentioning
confidence: 99%
See 2 more Smart Citations
“…19) The first step begins with the reduction of SiO2 by carbon sources to generate SiO gas as shown in reaction (6) at the interface between SiO2 and C particles, which is an initial and endothermic reaction. (6) Once CO gas is formed as a by-product, SiO can also be generated according to exothermic reaction (7).…”
Section: Resultsmentioning
confidence: 99%
“…(6) Once CO gas is formed as a by-product, SiO can also be generated according to exothermic reaction (7).…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…Al 4 SiC 4 and Al 4 Si 2 C 5 are low cost potential materials for high-temperature and weight sensitive applications due to its low density (3.03 g/cm 3 ), high melting point (~2253 K) and excellent oxidation resistance [2][3][4][5]. Both of them have hexagonal structures (P6 3 mc for Al 4 SiC 4 , 3 R m for Al 4 Si 2 C 5 ), and the crystallographic parameters were provided in detail by Inoue et al [6].…”
Section: Introductionmentioning
confidence: 99%
“…This is expected to be universal for the KPZ surface on a flat substrate and may have relevance for the study of the GOE Dyson's Brownian motion. More detailed analysis and results for the discrete TASEP will be reported elsewhere [36].…”
mentioning
confidence: 99%