Preparation and properties of MoSx films grown by d.c. magnetron sputtering

Influence of the Composition on the Properties of (Cr1–xAlx)N/MoySz PVD Coatings

“…This leads to a hexagonal fine-crystalline structure for the Mo y S z particles (type I). This is in agreement with the studies by Aubert et al [17] which show a more crystalline phase with a (110) texture for the coatings richer in S (z/y > 1.9). In general, the degree of crystallinity increases as the S content increases.…”

“…Above this value, the coatings are roughly crystalline and the hexagonal structure begins to appear. [17] As mentioned before, z/y ranges between 2.06 and 2.62 in the present study. This leads to a hexagonal fine-crystalline structure for the Mo y S z particles (type I).…”

“…[14][15][16] Owing an extreme low coefficient of friction (CoF), MoS 2 can be used as a lubricant coating for mechanisms working under severe environmental conditions, e.g., in space and nuclear applications. [14,17] Application of MoS 2 PVD coatings on tools reduces friction, but does not provide enough hardness and load carrying capacity for tribological applications with high surface pressures. Besides, adhesion between the coating and the substrate surface is not sufficient.…”

Growth mechanisms and near-interface structure in relation to orientation of MoS2 sputtered thin films

“…1 3 With different methods, some authors succeeded in producing films with basal planes parallel with the substrate. 4 " 9 The advantages of such films are a better stability with respect to oxidation and an orientation of the basal planes directly in the sliding direction of the substrate, resulting in an increased wear life. 9 Basal plane orientation is also important in thin films of other similar layered materials for various applications.…”

Applications of Surface Science to Solid Lubricants

“…Proper target conditioning, which involves multiple, sequential sputter runs, with rigorous control of the environment, followed by insertion of the substrates to be coated, is required to obtain basal orientation from a conventional compound MoS 2 target [8]. In contrast, such ordered films can be produced readily with reactive sputtering (H 2 S) and an Mo metal target [87,96]. Buck [18] has explained these phenomena in terms of the competition of water vapor with the arriving MoS 2 during the deposition step.…”