Chromium oxide thin films were atomic layer deposited from CrO2Cl2 and CH3OH on α‐Al2O3(0 0 1) (c ‐sapphire) substrates at 420 °C. On the basis of X‐ray reflection evidence, the thickness of the films in a series prepared ranged from 4 to 400 nm. As it was ascertained by reflection high‐energy electron diffraction, the films grew epitaxially. Electron probe microanalysis showed that O/Cr atomic ratio in them was close to 1.5 and that the residual impurities were present in insignificant amounts. The rms roughness of the films measured by atomic‐force microscopy and X‐ray reflection was of the order of 1 nm or less. X‐ray diffraction and Raman scattering data suggested that the films were strained, and that the strain was tensile in the c direction and compressive in the c plane. According to the surface Brillouin scattering measurements, the elastic properties of the films differed only slightly from those for single‐crystal bulk chromia. The films, when surface activated with Pt nanoislands, had a moderate response to CO in air with the transition times in the range of tens of seconds. (© 2009 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)