Preparation of Ag‐<scp>AZO</scp> Nanocomposite Powder Compact for <scp>RF</scp> Magnetron Sputtering Target Application

Chau, Joseph Lik Hang; Chou, Ya-Wen; Wang, Shun-Huei; Yang, Chih-Chao

doi:10.1111/ijac.12017

Cited by 4 publications

(2 citation statements)

References 19 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…Al-doped zinc oxide (AZO) has many advantages over indium-tin oxide (ITO) as a transparent conducting oxide owing to its low cost, abundance, high thermal stability and absence of toxicity [1]. Zinc oxide with an addition of 2 wt% Al 2 O 3 is regarded as a potential substitute for ITO due to its versatility [2]. At presently, the manufacture of AZO ceramics have received significant attention because of their applicability as commercial magnetron sputtering targets for film deposition [1][2][3][4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

See 1 more Smart Citation

Colloidal Dispersion of High Solid Loading ZnO Powders with 2 wt% Al2O3 Stabilized with Polyelectrolyte

Wang

Sun²,

et al. 2014

AMM

View full text Add to dashboard Cite

The high solid loading slurries with ZnO-Al2O3powders stabilized with polyelectrolytes have been studied. The influence of Sodium poly(acrylate) (PA 30) on the fluidity and stablility of the slurries was investigated. Morphological features of ZnO-Al2O3powders in suspension and fracture surface of green compact were observed using TEM and SEM. The slurries with pH 9 were prepared after milled using ZnO mixed powders and the PA 30 solution of pH 8. As 0.2 wt% PA 30 added, the lowest viscosity and the highest sediment were obtained. ZnO and Al2O3particles had been homogeneous dispersed. The maximum density (66.7 %TD) of green compact was obtained.

show abstract

Section: Introductionmentioning

confidence: 99%

“…Zinc oxide with an addition of 2 wt% Al 2 O 3 is regarded as a potential substitute for ITO due to its versatility [2]. At presently, the manufacture of AZO ceramics have received significant attention because of their applicability as commercial magnetron sputtering targets for film deposition [1][2][3][4][5][6][7].…”

Section: Introductionmentioning

confidence: 99%

Colloidal Dispersion of High Solid Loading ZnO Powders with 2 wt% Al2O3 Stabilized with Polyelectrolyte

Wang

Sun²,

et al. 2014

AMM

View full text Add to dashboard Cite

show abstract

Preparation of La0.8Sr0.2CoO3-δ sputtering targets using a deformable compaction die

Torunoglu

Kalay

Őztürk

2017

Ceramics International

View full text Add to dashboard Cite

Advances in Powder-based Technologies for Production of High-Performance Sputtering Targets

Mwema

Akinlabi

Oladijo

et al. 2020

Materials Performance and Characterization

View full text Add to dashboard Cite

The sputtering method has been extensively adopted for the production of high-performance thin films and coatings. This can be attributed to its versatility and flexibility, which allows easier tailoring of the properties and characteristics of the sputtered films and coatings for the desired application and performance. Contrary to thermal spray and chemical techniques, sputtering can be performed at room temperature for a wide range of targets, thus overcoming the challenges, such as residual stresses and degradation of the substrates, associated with high-temperature processes. The most important aspect of the sputtering is the target from which the thin film material is derived. The quality of the target determines the properties and performance of the resulting film and coating. Published data reveal that the quality of the targets depends mainly on the method of production. Although different manufacturing techniques have been used to produce these targets, consolidation of powders has been shown to provide outstanding results. The production of these targets through powder metallurgy depends on the compaction or sintering methods and associated processing parameters. With the increasing demand for high-performance thin films and coatings, such as high-entropy alloy films, the quality of the targets used for sputtering is crucial for application in various fields that include medical, electronics, and energy. In this article, progress on the powder metallurgy on the manufacturing of sputtering targets is detailed. Advances in various powder technologies, process parameters, and conditions, and their interrelationships with properties and performance of targets and sputtered thin films will be discussed, synthesized, and general/specific trends will be derived. This article will serve as a resource for metallurgists in the optimization and development of advanced targets for industry 4.0.

show abstract

Preparation of Ag‐AZO Nanocomposite Powder Compact for RF Magnetron Sputtering Target Application

Cited by 4 publications

References 19 publications

Colloidal Dispersion of High Solid Loading ZnO Powders with 2 wt% Al<sub>2</sub>O<sub>3</sub> Stabilized with Polyelectrolyte

Colloidal Dispersion of High Solid Loading ZnO Powders with 2 wt% Al<sub>2</sub>O<sub>3</sub> Stabilized with Polyelectrolyte

Preparation of La0.8Sr0.2CoO3-δ sputtering targets using a deformable compaction die

Advances in Powder-based Technologies for Production of High-Performance Sputtering Targets

Contact Info

Product

Resources

About