2011
DOI: 10.1007/s11051-011-0342-y
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Preparation of almost dispersant-free colloidal silica with superb dispersiblility in organic solvents and monomers

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Cited by 16 publications
(12 citation statements)
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“…The detailed preparation procedures can be found in our previous publications. [17][18][19][20][21] The dyegrafted silica (termed GSiO 2 ) was prepared by adding MR and additional HCl (aq) (pH 1.2) to the $6 nm silica sol. The condensation reaction between Si-OH or between Si-OH and Si-(OC 2 H 5 ), cf.…”
Section: Preparation Of Dye-grafted Silica Nanoparticlesmentioning
confidence: 99%
“…The detailed preparation procedures can be found in our previous publications. [17][18][19][20][21] The dyegrafted silica (termed GSiO 2 ) was prepared by adding MR and additional HCl (aq) (pH 1.2) to the $6 nm silica sol. The condensation reaction between Si-OH or between Si-OH and Si-(OC 2 H 5 ), cf.…”
Section: Preparation Of Dye-grafted Silica Nanoparticlesmentioning
confidence: 99%
“…The solid content of each MTSiO 2 sol based on complete hydrolysis and condensation of alkoxy groups was about 26 wt.%. The particle sizes of MTSiO 2 particles were about 5-10 nm [26].…”
Section: Preparation Of Surface-modified Silica Nanoparticlesmentioning
confidence: 97%
“…Colloidal silica nanoparticles were prepared by a modified sol-gel process shown in our previous publications [20,26]. Briefly, TEOS was mixed with IPA at a molar ratio of 1.0 to form a homogeneous solution.…”
Section: Preparation Of Surface-modified Silica Nanoparticlesmentioning
confidence: 99%
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“…The most effective approach is nanoparticle surface functionalization to provide hydrophobic functional groups that can mix homogeneously with hydrophobic liquid media, such as organic solvents, and thus readily integrate with the dissolved polymer chains [25][26][27]. Recent work with hybrid materials highlights the importance of organic dispersants as the anchoring and binding species for the nanoparticles and polymers [26,[28][29][30].…”
Section: Introductionmentioning
confidence: 99%