Lithium silicate thin films were successfully deposited by pulsed laser deposition (PLD) technique using an ArF excimer laser. The ionic conductivities, the structures and the stability against CO 2 of the lithium silicate films were examined. The ionic conductivity value at 25°C was 2.
IntroductionAll-solid-state thin-film rechargeable lithium batteries are now demanded for micro power devices. The key material for the TFB is amorphous lithium-ion conductor as the electrolyte. In comparison with crystalline electrolyte, amorphous materials have advantages such as good contact with electrode, isotropy of lithium ion conduction and so on. TFBs should be stable for many cycles. Therefore it is important to develop a thin film solid electrolyte which is stable in cycles especially against possible reductions at negative electrode.LVSO (Li 2 O-V 2 O 5 -SiO 2 ) is the amorphous solid state electrolyte which is deposited by PLD 1,2) . The battery fabricated with LVSO (Li 2.2 V 0.54 Si 0.46 O 3.4 ) film shows poor reversibility on CV cycles. This is because of the reduction of vanadium at the interface to the negative electrode.Lithium silicate glasses (Li 2 O-SiO 2 ), which is prepared by removing vanadium from LVSO, are an amorphous solid-state-electrolyte with a wide band gap, which has good charge-discharge reversibility in cycles. Because of its wide gap, lithium silicate thin film is difficult to be deposited by pulsed laser deposition (PLD) technique. By using an ArF excimer laser ( =193 nm), the lithium silicate thin film can be successfully deposited.