Preparation of antireflection structures with heat resistance by nanoimprinting using anodic porous alumina molds

Abstract

Polysiloxane antireflective structures composed of tapered nanopillar arrays were prepared by nanoimprinting using anodic porous alumina molds with tapered pores. Because polysiloxane is a heat-resistant material, the resulting tapered nanopillar array structures were maintained even after heat treatment at 200ºC. In addition, no significant changes in antireflection properties were observed before and after heat treatment at 200ºC. These results indicate that the polysiloxane nanopillar arrays obtained in this study can be applied as heat-resistance antireflection structures.