2024
DOI: 10.21203/rs.3.rs-4373363/v1
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Preparation of contamination-resistant ultraviolet broadband double-layer antireflective coating

Wenwen Wang,
Zhiyong Jin,
Zhiwei Xiao
et al.

Abstract: A double-layer broadband antireflection (AR) coating with excellent transmittance at 250–400 nm has been designed and prepared by the sol-gel method. The quarter-half double-layer structure is optimized with the aid of Filmstar thin film design software. Mesoporous SiO2 film templated by an ethylene oxide-propylene oxide-ethylene oxide triblock copolymer is used as the top layer, and a ZrO2-SiO2 hybrid film with matching refractive index is employed as the bottom layer. 1H, 1H, 2H, 2H-Perfluorodecyltriethoxysi… Show more

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