2010
DOI: 10.1142/s0218625x10014296
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Preparation of Gradated Nano-Transient Layer at Interface Between Deposited Film and Substrate by High-Intensity Pulsed Ion Beam Irradiation

Abstract: We prepared gradated nano-transient layers at different interfaces between deposited film and substrates by high-intensity pulsed ion beam (HIPIB) irradiation. The deposited film was ( Al–Si ) alloy and substrates were Ni and Ti , respectively. The gradated nano-transient layers at different interfaces were measured by Rutherford backscattering, its spectra were solved by SIMNRA code and then the microstructures of the gradated nano-transient layers at the interfaces of these two irradiated samples were obtain… Show more

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“…The calculated values were in good agreement with experimental results obtained by RBS. RBS experiments by using 2×1.7meV tandem electrostatic accelerators were completed at the Institute of Heavy Ion Physics of Peking University and the RBS spectra solved by SIMNRA code [8,9] , as shown in Fig. 3 and Table 1.…”
Section: Resultsmentioning
confidence: 99%
“…The calculated values were in good agreement with experimental results obtained by RBS. RBS experiments by using 2×1.7meV tandem electrostatic accelerators were completed at the Institute of Heavy Ion Physics of Peking University and the RBS spectra solved by SIMNRA code [8,9] , as shown in Fig. 3 and Table 1.…”
Section: Resultsmentioning
confidence: 99%