Preparation of Micro-Patterned CaMn7O12 Ceramic Films via a Photosensitive Sol-Gel Method

Abstract

Mn/acetylacetone chelate was synthesized using Mn(CH3COO)2·4H2O as raw material, methanol as the solvent, and acetylacetone as the chelating agent. The ultraviolet (UV)-absorption peak of the synthesized chelate was found around 298 nm. CaMn7O12 sol was subsequently prepared using the Mn/AcAc chelate as the Mn source and calcium nitrate as the calcium source. The UV test indicates that the CaMn7O12 sol has the UV-sensitive characteristics. Owing to its photo-sensitivity, micro-patterned CaMn7O12 ceramic film can be prepared without photoresist, only through dip-coating, drying, UV-irradiation, solvent-washing, and heat treatment. The magnetic test result indicates that the micro-patterned CaMn7O12 ceramic film has a saturation magnetization of 112.8 emu/cm3, which is close to that of non-patterned CaMn7O12 ceramic film.

Acetylacetone promoted high-efficiency coagulation toward arsenite through a synchronous photooxidation process

“…S5a †), which may be because the complexation between this metal ion and AA reduced the concentration of available free AA. 47 Therefore, the presence of Mn 2+ reduced the removal efficiency of As(III) in the UV/AA + TS system (Fig. 6b).…”

Microfabrication of VO2 Thin Films via a Photosensitive Sol-Gel Method

“…To study the photolysis kinetics process of VO2 gel film under UV-light irradiation, a UV-vis spectrum test was carried out after UV exposure for every 20 min, and the timegradient spectrum results are shown in Figure 2. A strong UV absorption peak for the VO2 gel film appeared at about 302 nm, corresponding to π-π* transition in the cyclic chelate of vanadium [22]. The absorption intensity of cyclic chelate gradually decreased with increasing UV exposure time owing to the photodecomposition of cyclic chelate in the VO2 gel film.…”

“…In this study, a novel photoetching microfabrication method was developed to prepare micropatterns on VO2 thin films via a photosensitive sol-gel process based on our previous study [22]. The process does not require photoresist, and it also does not require expensive ion etching equipment to instantly produce micron-level fine patterns.…”

“…Furthermore, the terahertz application of VO 2 has gradually become a new focus recently [19][20][21], and a low-cost and short-term microfabrication technology is urgently needed to prepare antenna patterns for terahertz communications. In this study, a novel photoetching microfabrication method was developed to prepare micropatterns on VO 2 thin films via a photosensitive sol-gel process based on our previous study [22]. The process does not require photoresist, and it also does not require expensive ion etching equipment to instantly produce micron-level fine patterns.…”