1984
DOI: 10.1016/0040-6090(84)90092-0
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Preparation of Mo/Si Schottky barriers by chemical vapour deposition of molybdenum onto epitaxial silicon substrates

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1985
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Cited by 13 publications
(6 citation statements)
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“…Mo-Si system is one of the most used systems in various applications. This is widely used as Schottky contacts in microelectronics industries [61][62][63]. This is also used in interconnects in VLSI (very large scale integration).…”
Section: Interdiffusion Study In the Mo-si Systemmentioning
confidence: 99%
“…Mo-Si system is one of the most used systems in various applications. This is widely used as Schottky contacts in microelectronics industries [61][62][63]. This is also used in interconnects in VLSI (very large scale integration).…”
Section: Interdiffusion Study In the Mo-si Systemmentioning
confidence: 99%
“…However, the growth of silicides at the interface between the barrier metal and the substrate influences the performance of the product. The molybdenum-silicon system is important for many applications, such as Schottky contacts [11,12], very large scale integration (VLSI) interconnects and photomasks for VLSI fabrication [13,14], soft X-ray mirror [15,16], etc. Heating elements for furnaces and high temperature coatings are produced from MoSi 2 because of its excellent oxidation resistance [17].…”
Section: Introductionmentioning
confidence: 99%
“…Metal silicides are important in many applications. For example, molybdenum silicides are used as Schottky contacts [1][2][3] and interconnects [4,5]. Mo is also used as an interlayer to diffusion bond brittle Si 3 N 4 .…”
Section: Introductionmentioning
confidence: 99%