2005
DOI: 10.1021/ma040108p
|View full text |Cite
|
Sign up to set email alerts
|

Preparation of Poly(silylene-p-phenylene)s Containing a Pendant Fluorophor and Their Applications to PL Imaging

Abstract: Poly(silylene-p-phenylene)s bearing an anthrylethynyl, pyrenylethynyl, or terthienyl group as the pendant were obtained in moderate yield, by substitution reactions of poly[ethoxy(methyl)silylenep-phenylene] with the corresponding organolithium reagents in THF. The polymers exhibited photoluminescent (PL) properties in solutions as well as in the films. They were photoactive and irradiation of the films in air with a low-pressure mercury lamp led to a decrease of PL efficiencies, being applicable to PL imaging… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

0
36
0

Year Published

2006
2006
2014
2014

Publication Types

Select...
8

Relationship

2
6

Authors

Journals

citations
Cited by 37 publications
(36 citation statements)
references
References 11 publications
0
36
0
Order By: Relevance
“…[8,9] Recently, fluorescence imaging technology has been used for the mapping of photogenerated radicals in thin polymer films; [10] fluorescent probes have also been used to map pH gradients and study acid diffusion in chemically amplified photoresists, [11,12] as well as for the photoluminescence imaging of fluorescent conjugated polymers. [13,14] Several methods for preparing fluorescent patterns in polymer films have been reported in the literature. These include protonation induced by a photoacid generator, [6,9,12,15,16] as well as chemical amplification catalyzed by a photoacid generator.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…[8,9] Recently, fluorescence imaging technology has been used for the mapping of photogenerated radicals in thin polymer films; [10] fluorescent probes have also been used to map pH gradients and study acid diffusion in chemically amplified photoresists, [11,12] as well as for the photoluminescence imaging of fluorescent conjugated polymers. [13,14] Several methods for preparing fluorescent patterns in polymer films have been reported in the literature. These include protonation induced by a photoacid generator, [6,9,12,15,16] as well as chemical amplification catalyzed by a photoacid generator.…”
Section: Introductionmentioning
confidence: 99%
“…[3,[17][18][19][20][21][22] Most of these preparation methods are based on photogenerated acids, although other methods precluding the use of photoacid generators have also been reported such as the photobleaching of fluorescent polymers. [7,13,14,23,24] Photobase generators are a group of compounds that produce a base upon irradiation. These compounds have been used as photochemical crosslinking agents for epoxy resins, and also as photoresists, surface modifiers, and imidation catalysts for poly(amic ester)s. Photobase generators are increasingly being used for the development of new technologies.…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4][5][6] Fluorescence image patterning, however, has been conducted exclusively by a typical photolithographic method in several research groups including us. [7][8][9][10][11] Meanwhile, a soft lithography process is usually fast and inexpensive as compared to the photolithographic method, which can be easily adopted for patterning non-planar surfaces and/or three-dimensional (3-D) structures. [6] The production of single-level structures for use in microelectrode arrays, sensors, biosensors, and microanalytical systems, relaxes the requirements for precise alignment, continuity, isolation, and uniformity in the final patterns.…”
Section: Introductionmentioning
confidence: 99%
“…There has been current interest in organosilicon polymers composed of an alternating arrangement of an organosilicon unit and p-electron system, since they may be used as functionality materials, 1,2 such as, for example, photoluminescent materials [3][4][5][6][7] and hole-transporting materials. 8 In addition, highly heat-resistant properties are often noted for this type of polymers.…”
Section: Introductionmentioning
confidence: 99%