La 2 S 3 thin films were prepared by dipping the substrates in methanol solutions of LaCl 3 Á7H 2 O and CS(NH 2 ) 2 , followed by sulfurization with CS 2 gas in the temperature range of 773-1073 K. The effects of the substrate and the mole ratio of LaCl 3 Á7H 2 O to CS(NH 2 ) 2 on the phase formation after sulfurization were investigated. When the mole ratio of LaCl 3 Á7H 2 O to CS(NH 2 ) 2 was 2:3, the tetragonal -La 2 S 3 coatings were obtained on silica glass and Mo substrates for sulfurization at 1073 K. On the other hand, the cubic -La 2 S 3 coating was obtained on a soda-lime glass substrate for sulfurization at 973 K. The thin films on Ta and Ti substrates were comprised of -La 2 S 3 and -La 2 S 3 phases for sulfurization at 1073 K. The LaS 2 phase was identified as an intermediate product of sulfurization at about 873 K. When the mole ratio of LaCl 3 Á7H 2 O to CS(NH 2 ) 2 was 1:1, the -La 2 S 3 coating was also obtained on silica glass substrate for sulfurization at 1073 K. Since the gaseous phases formed during sulfurization pass through the La 2 S 3 layer, the thin films obtained were porous.