“…[9][10][11][12] In general, mesoporous oxide lms such as Al 2 O 3 and SiO 2 were prepared by sol-gel and similar techniques. 7,10,17,18 However, such techniques involve a heating activation stage to get the nal lm, produce a substantial amount of waste materials, and generally lack uniformity in terms of lm thickness and composition. [19][20][21] In our previous work, as an alternative to the solution process, a conventional plasma-enhanced chemical vapor deposition (PECVD) process was used to facilitate the one-step deposition of nanoporous SiO 2 -based proton conducting thin lms at low temperature.…”