Preparation of Thick Functionally Graded Layers of Ceramics by Surface Modification of Tantalum and Titanium Using High Temperature Plasma Processing

Nunogaki, Masanobu; Inoue, Masahiro; Kitahama, Katsuki

doi:10.2320/matertrans.42.457

Cited by 5 publications

(9 citation statements)

References 1 publication

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“…The diffusion kinetics of these interstitial atoms strongly depend on the bond characteristics, i.e., covalency and ionicity, with the lattice of substrate materials. According to the results of XRD, [2] the main constituent phases of these layers were TiC and TiN, respectively. 2b.…”

Section: Carburization and Nitridation Of Timentioning

confidence: 99%

Novel Reactive Plasma Processing for Transforming Surfaces of Metals and Intermetallics to Ceramics

Inoue

Nunogaki

Yamamoto

2002

Materials and Manufacturing Processes

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The surface of Ti, Zr, and TiAl was directly transformed to ceramics with a graded composition by carburizing, nitriding, and oxidizing using novel reactive plasma processing that has been developed by the present authors. Thick modified layers which consist of TiC, TiN, ZrC, ZrN (Zr 2 N), ZrO 2 , and Ti 2 AlN were successfully synthesized by this plasma process. The ceramic layers exhibited higher hardness and elastic modulus than the substrates. The formation behavior of these ceramic layers was analyzed with ab initio molecular orbital simulation and thermodynamic calculation. The chemical interaction of the interstitial atoms with the lattice of substrate materials was found to govern the diffusion and ordering processes to form the ceramic layers.

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Section: Carburization and Nitridation Of Timentioning

confidence: 99%

Novel Reactive Plasma Processing for Transforming Surfaces of Metals and Intermetallics to Ceramics

Inoue

Nunogaki

Yamamoto

2002

Materials and Manufacturing Processes

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“…To solve this problem, reactive plasma processing at elevated temperature has been proposed for the direct transformation of the metal surface into ceramics [3]. Nunogaki et al [4][5][6] used the reactive plasma process to modify the surface of Zr, Al, Fe, * Corresponding author. Tel.…”

Section: Introductionmentioning

confidence: 99%

Characterization of electron beam modified surface of Zircaloy-4

Ahmad

Akhter

Ali

et al. 2006

Journal of Alloys and Compounds

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“…[4][5][6] In the present work, Zr plates (purity: 99.7%; Nilaco Co., Ltd., Tokyo, Japan) with dimensions of 8 mm × 3 mm × 1 mm were used as substrates for the process. The plates were polished with 0.1 µm Al 2 O 3 powder dispersed in water, and annealed for 3 h at 350 • C under vaccum (∼10 −3 Pa).…”

Section: Apparatus and Process Conditionsmentioning

confidence: 99%

“…The present authors have experimentally succeeded in the surface modification of metals and intermetallics, such as Zr, Al, Fe, Ti, Ta, and TiAl, with plasmas containing low-Z elements such as C, N and O. [4][5][6][7] In this paper, some preliminary results of surface modification of Zr by reactive plasma process are reported.…”

Section: Introductionmentioning

confidence: 99%

“…In fact, the present authors have already reported that the modified layer thickness and hardness are remarkably improved by a 20 MeV electron beam pre-irradiation with an optimum fluence in the surface treatment of Ti and Ta. 6) In the present work, the electron beam irradiation was also conducted as a pre-treatment for the surface modification of Zr.…”

Section: Introductionmentioning

confidence: 99%

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Direct Surface Modification of Zirconium by Reactive Plasma Processing at Elevated Temperatures

Inoue

Yamashita

Suganuma

et al. 2001

Journal of Nuclear Science and Technology

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This paper investigates a surface modification process for Zr to improve its durability, in order to make use of Zr in a blanket module as an effective neutron multiplier with (n, 2n) reaction. Modified ceramic layers were successfully synthesized on Zr substrates by carburizing, nitriding and oxidizing using reactive plasma processes. The microstructural evolution during the plasma process is governed both by the kinetics of the diffusion and by the kinetics of the ordering to form the reaction products. In the case of carburizing, the growth rate of the carbide layer is restrained by the diffusion of C, which was clarified to exhibit high covalency with the neighboring Zr atoms by a first principles molecular orbital simulation, through the layer. By contrast, the diffusion of O which exhibits high ionicity rather than covalency with the Zr lattice is much faster than the rate of ordering to form the monoclinic ZrO 2 phase. A 20 MeV electron beam pre-irradiation process was also conducted at ambient temperatures as a pre-treatment before the plasma process. The electron beam irradiation can influence the reaction behavior during the plasma process, depending on the process conditions.

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Preparation of Thick Functionally Graded Layers of Ceramics by Surface Modification of Tantalum and Titanium Using High Temperature Plasma Processing

Cited by 5 publications

References 1 publication

Novel Reactive Plasma Processing for Transforming Surfaces of Metals and Intermetallics to Ceramics

Novel Reactive Plasma Processing for Transforming Surfaces of Metals and Intermetallics to Ceramics

Characterization of electron beam modified surface of Zircaloy-4

Direct Surface Modification of Zirconium by Reactive Plasma Processing at Elevated Temperatures

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