Preparation of Ti–Al–N Electrode Films by Pulsed Laser Ablation   for Lead-Zirconate-Titanate Film Capacitors

Morimoto, Akira; Yamanaka, Yasuhiro; Shimizu, Tatsuo

doi:10.1143/jjap.35.l227

Cited by 6 publications

(5 citation statements)

References 18 publications

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“…FIB-CVD processing of self-organized ripples on the sides of Pt pillars (pagodas in figure 7(g)) is fast and reproducible (figure 7(h)), but modeling is complex to evaluate the implantation cascade and subsequent secondary emission at the sides that activate ripple growth. FIB etching can also remove ripples from sides of tips (figure 7(i)), if appropriate for field emitting nanoscale neutron sources [84,85]. The complexities of ionassisted-CVD in 2D and especially FIB-CVD in 3D require further characterization of experiments and modeling [86,87].…”

Section: Self-organized Ripples Deposition During Erosion and Erosion...mentioning

confidence: 99%

Dual-beam focused ion beam/electron microscopy processing and metrology of redeposition during ion–surface 3D interactions, from micromachining to self-organized picostructures

MoberlyChan

2009

J. Phys.: Condens. Matter

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Focused ion beam (FIB) tools have become a mainstay for processing and metrology of small structures. In order to expand the understanding of an ion impinging a surface (Sigmund sputtering theory) to our processing of small structures, the significance of 3D boundary conditions must be realized. We consider ion erosion for patterning/lithography, and optimize yields using the angle of incidence and chemical enhancement, but we find that the critical 3D parameters are aspect ratio and redeposition. We consider focused ion beam sputtering for micromachining small holes through membranes, but we find that the critical 3D considerations are implantation and redeposition. We consider ion beam self-assembly of nanostructures, but we find that control of the redeposition by ion and/or electron beams enables the growth of nanostructures and picostructures.

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Section: Self-organized Ripples Deposition During Erosion and Erosion...mentioning

confidence: 99%

Dual-beam focused ion beam/electron microscopy processing and metrology of redeposition during ion–surface 3D interactions, from micromachining to self-organized picostructures

MoberlyChan

2009

J. Phys.: Condens. Matter

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“…Perovskite PZT film was found to be grown on the TAN electrode, resulting in a ferroelectric hysteresis loop. However, the interface layer of the TAN was oxidized to some extent by the PZT deposition due to a low quality of the TAN film [7]. In the present study, the effect of ambient N 2 gas on the preparation of TAN thin films by PLA is explored for high-quality film synthesis.…”

Section: Introductionmentioning

confidence: 97%

“…TiN, however, is not sufficiently oxidation-resistant [6] for the preparation of PZT. Thus, we proposed Ti-Al-N (TAN) as an oxidation-resistant electrode material for the PZT based on the idea that aluminum oxide is good barrier against oxidation [7]. Perovskite PZT film was found to be grown on the TAN electrode, resulting in a ferroelectric hysteresis loop.…”

Section: Introductionmentioning

confidence: 99%

Effect of nitrogen gas on preparation of Ti–Al–N thin films by pulsed laser ablation

Morimoto¹,

Shigeno²,

Morita³

et al. 1998

Applied Surface Science

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The effect of ambient N 2 gas on the preparation of Ti 0.9 Al 0.1 N (TAN) thin films for ferroelectric capacitors by pulsed laser ablation (PLA) using ArF and KrF excimer lasers was explored. The TAN films were prepared on (100)Si substrates heated at 620 ºC in various N 2 pressures ranging from vacuum to 130 Pa. The TAN crystal growth was found to be influenced by the content of unintentionally-incorporated O which was found to be controlled by the introduction of N 2 gas into the deposition chamber. The O content for films prepared by KrF was found to be smaller than that for films prepared by ArF because of the smaller optical absorption cross-section of KrF excimer laser for residual O 2 or H 2 O molecules in the chamber and/or the higher deposition rate. The TAN film prepared by KrF excimer laser was found to be nearly epitaxial Si with a cube-on-cube crystallographic orientation.

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“…Then we prepared perovskite PZT films on Ni-alloy and Ti-Al-N electrodes [13,14]. Then, the PLD methods have attracted much attention in the field of ferroelectrics as a useful method to prepare good films.…”

Section: Introductionmentioning

confidence: 99%

Fatigue-resistant epitaxial Pb(Zr,Ti)O3 capacitors on Pt electrode with ultra-thin SrTiO3 template layers

Takahara¹,

Morimoto²,

Kawae³

et al. 2008

Thin Solid Films

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Lead zirconate-titanate Pb(Zr,Ti)O 3 (PZT) capacitors with Pt bottom electrodes were prepared on MgO substrates by pulsed laser deposition (PLD) technique employing SrTiO 3 (STO) template layer. Perovskite PZT thin films are prepared via stoichiometric target using the ultra-thin STO template layers while it is quite difficult 1 Present address: Kanazawa Murata Mfg., Co., Ltd., Hakusan 920-2101, Japan  Corresponding author: e-mail amorimot@ec.t.kanazawa-u.ac.jp, tel +81-76-234-4876 * Manuscript2 to obtain the perovskite PZT on Pt electrode via stoichiometric target in PLD process.The PZT capacitor prepared with the STO template layer showed good hysteresis and leakage current characteristics, and it showed an excellent fatigue-resistance. The ultra-thin STO template layers were characterized by angle-resolved X-ray photoelectron spectroscopy measurement. The effect of the STO template layer is discussed based on the viewpoint of the perovskite nucleation and diffusion of Pb and O atoms.

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Preparation of Ti–Al–N Electrode Films by Pulsed Laser Ablation for Lead-Zirconate-Titanate Film Capacitors

Cited by 6 publications

References 18 publications

Dual-beam focused ion beam/electron microscopy processing and metrology of redeposition during ion–surface 3D interactions, from micromachining to self-organized picostructures

Dual-beam focused ion beam/electron microscopy processing and metrology of redeposition during ion–surface 3D interactions, from micromachining to self-organized picostructures

Effect of nitrogen gas on preparation of Ti–Al–N thin films by pulsed laser ablation

Fatigue-resistant epitaxial Pb(Zr,Ti)O3 capacitors on Pt electrode with ultra-thin SrTiO3 template layers

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