Preparation of tin oxide monolith by the sol-gel method from inorganic salt

Microstructural evolution of oxides and semiconductor thin films

“…Recently, there is an ever increasing range of techniques which are used to deposit SnO 2 thin films. Some of the more common techniques include electron beam evaporation [8], dip coating [9], reactive thermal evaporation [10], chemical vapor deposition (CVD) [11], pulsed laser deposition (PLD) [12], sputtering [13,14], spray pyrolysis [15], atomic layer epitaxy [16], sol-gel [17], plasma polymerisation [18], and glow discharge decomposition of tin compounds [19]. Pulsed laser deposition of thin films has been proven to be a useful technique in recent years because of its ability to achieve rapid growth rate and to produce stoichiometric thin films of complicated compounds such as superconductors [20].…”

Synthesis of High-Molecular-Weight Poly(L-lactic acid) by Direct Polycondensation

“…According to Figure 4, only a SnO 2 crystalline structure appeared in the case of Ti:Sn ¼ 0.4:1. [12] As Ti content was increased, the intensity of peak at 25.18 and 48.88 was increased. It shows that TiO 2 with anatase structure was formed in the SnO 2 crystalline structure (TiO 2 /SnO 2 ).…”

Active Ti/SnO2 anodes for pollutants oxidation prepared using chemical vapor deposition

“…As demonstrated in XRD analysis, the SnO 2 crystallites obtained in this work show preferred orientation along the (211), (101) and (301) planes. In contrast, the SnO 2 crystallites prepared by spray pyrolysis and sol-gel usually display preferred orientation along the (110) plane [23,[38][39][40]. Such a large difference in crystal microstructure may lead to a difference in electrocatalytic activity for pollutants oxidation.…”

“…In addition, no crystallized TiO 2 peaks were detected, indicating no thick crystallized TiO 2 layer was formed during CVD. Moreover, the film shows preferred orientation along the (211), (101) and (301) planes, while the SnO 2 coatings prepared by spray pyrolysis and sol-gel usually have preferred orientation along the (110) plane [23,[38][39][40]. This indicates that the electrodes prepared by CVD are rather different in microstructure from those prepared by the conventional methods.…”