2004
DOI: 10.1016/j.mseb.2003.12.010
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Preparation of TiO2 thin film by liquid sprayed mist CVD method

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Cited by 84 publications
(42 citation statements)
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“…The orientation factor f = 1 means the complete orientation growth of the (hkl) direction; on the other end, complete random state is shown by f = 0. 22) The values of f (004) for as-deposited TiO 2 film and the top TiO 2 layer on the double-layer film are calculated to be 0.07 and 0.92, respectively. That is, the TiO 2 film shows nearly random growth, while TiO 2 layer of the double-layer film shows nearly complete (004) c-axis orientation growth.…”
Section: Structure Characterization Of Tio 2 /Zno Filmsmentioning
confidence: 99%
“…The orientation factor f = 1 means the complete orientation growth of the (hkl) direction; on the other end, complete random state is shown by f = 0. 22) The values of f (004) for as-deposited TiO 2 film and the top TiO 2 layer on the double-layer film are calculated to be 0.07 and 0.92, respectively. That is, the TiO 2 film shows nearly random growth, while TiO 2 layer of the double-layer film shows nearly complete (004) c-axis orientation growth.…”
Section: Structure Characterization Of Tio 2 /Zno Filmsmentioning
confidence: 99%
“…Many methods have been reported for the production of nanoparticles of TiO 2 , such as chemical vapor decomposition (CVD) [72], hydrothermal and solvothermal methods [7,82,137], direct oxidation methods [149] and sol-gel method [109,148], among others.…”
Section: Sol-gel Methods For Producing Nanoparticlesmentioning
confidence: 99%
“…Many methods have been reported for the production of nanoparticles of TiO 2 , such as chemical decomposition in solution (CSD) [43], chemical vapor decomposition [72], sol-gel method [109,148], ultrasonic irradiation [109], thermal and hydrothermal ethanol [35,143], hydrothermal and solvothermal methods [7,82,137], and direct oxidation methods [149], among others. Various polar and nonpolar solvents have been used in these processes, which generally require high calcination temperatures (above 450°C) to form a regular crystalline structure (anatase).…”
Section: Preparation Of Titanium Nanoparticles (Anatase) By Sol-gelmentioning
confidence: 99%
“…Numerous techniques have been used in the formation/fabrication of films on substrates of various materials with physical vapor deposition (PVD) [10] or chemical vapor deposition (CVD) [11]. However, large and complicated equipment is required; also these techniques can be only operated in a high vacuum condition.…”
Section: Introductionmentioning
confidence: 99%