2021
DOI: 10.55713/jmmm.v31i2.1066
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Preparation of transparent alumina thin films deposited by RF magnetron sputtering

Abstract: Alumina (Al2O3) thin films were prepared by RF magnetron sputtering technique using Al2O3 ceramic target. Effects of sputtering powers and oxygen gas mixtures were investigated and the optimized coating condition was applied on semi-precious gemstones. RF sputtering powers were varied to optimize the transparency of the films. Besides, the oxygen gas mixtures were also studied at the optimized sputtering power with a constant sputtering pressure. Optical and physical properties of the thin films were investiga… Show more

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