1998
DOI: 10.1039/a802265h
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Preparation of transparent mesoporous silica films by a rapid solvent evaporation method

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Cited by 24 publications
(3 citation statements)
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“…The preparation of films of these materials has been accomplished primarily over non-porous substrates (e.g., mica [3], glass [4,5], silicon wafers [6,7]), which are not suitable as membrane supports. The first attempt to grow mesostructured silica films on a support was reported in 1996 by Yang et al [3], who carried out the hydrothermal treatment of a mica support immersed in an aqueous-acid-surfactant mixture.…”
Section: Introductionmentioning
confidence: 99%
“…The preparation of films of these materials has been accomplished primarily over non-porous substrates (e.g., mica [3], glass [4,5], silicon wafers [6,7]), which are not suitable as membrane supports. The first attempt to grow mesostructured silica films on a support was reported in 1996 by Yang et al [3], who carried out the hydrothermal treatment of a mica support immersed in an aqueous-acid-surfactant mixture.…”
Section: Introductionmentioning
confidence: 99%
“…Figure shows the collected FTIR spectra of the untreated cotton and cotton–MBA–Cl. In the spectrum of cotton–MBA–Cl, the peaks at 2926 and 2854 cm –1 (corresponding to the symmetric and asymmetric stretching vibration of the C–H bonds on −CH 2 –CH 2 −) became stronger because the −CHCH– double bonds in MBA became −CH 2 CH 2 – after it was grafted onto cotton (as we can see in Figure ). The new peak at 1458 cm –1 corresponds to the in-plane bending vibration of the C–H bonds on −CH 2 –CH 2 –, which also demonstrated that the −CH 2 –CH 2 – became greater, and the new peak at 1281 cm –1 ascribes to the C–N vibrational bond .…”
Section: Results and Discussionmentioning
confidence: 86%
“…Liquid phase deposition (LPD) is a method that can obtain crystalline metal oxide films directly from aqueous solutions at low temperatures (25e100 C) [19]. The surface roughness and wettability can be readily manipulated in just one process by this approach.…”
Section: Introductionmentioning
confidence: 99%